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Guiñón, J. L.; Garcı́a-Antón, J.; Pérez-Herranz, V.

doi:10.1023/a:1003981509603

Cited by 13 publications

(4 citation statements)

References 26 publications

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“…To reduce noise and outliers in the longitudinal data, we applied the Savitzky-Golay filter, a polynomial smoothing filter (Figure 1B) found to better preserve temporal data, with a signal to noise ratio 2 times higher than a simple moving mean filter …”

Section: Methodsmentioning

confidence: 89%

Association of Selective Serotonin Reuptake Inhibitor Use With Abnormal Physical Movement Patterns as Detected Using a Piezoelectric Accelerometer and Deep Learning in a Nationally Representative Sample of Noninstitutionalized Persons in the US

et al. 2022

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IMPORTANCESelective serotonin reuptake inhibitors (SSRIs) are a common first-line treatment for some psychiatric disorders, including depression and anxiety; although they are generally well tolerated, SSRIs have known adverse effects, including movement problems, sleep disruption, and gastrointestinal problems (eg, nausea and upset stomach). No large-scale studies using naturalistic, longitudinal, objective data have validated physical activity findings, and actigraphy data are well suited to address this task. OBJECTIVES To evaluate whether differences in physical movement exist among individuals treated with SSRIs compared with control participants and to identify the unique features of the movement of patients treated with SSRIs. DESIGN, SETTING, AND PARTICIPANTS This cross-sectional study examines longitudinally collected wearable movement data within a cross-sectional sample of 7162 participants from the 2005-2006 National Health and Nutrition Examination Survey (NHANES), a nationally representative population-based sample of noninstitutionalized persons in the US having both medication information and passive movement data. Statistical analysis was performed from April 1, 2021, to February 1, 2022.EXPOSURES The use of SSRIs (sertraline hydrochloride, escitalopram oxalate, fluoxetine hydrochloride, paroxetine hydrochloride, and citalopram hydrobromide), as reported by participants interviewed by NNHANES personnel, was the primary exposure, measured as a binary variable (taking an SSRI vs not taking an SSRI). MAIN OUTCOMES AND MEASURESThe primary outcome was the intensity of body movement as recorded by a piezoelectric accelerometer worn on the right hip for more than 1 week. RESULTSOf the 7162 participants included in the study, the mean (SD) age was 33.7 (22.6) years, 266 (3.7%) were taking an SSRI, 3706 (51.7%) were female, 1934 (27.0%) were Black, 1823 (25.5%) were Mexican American, 210 (2.9%) were other Hispanic, 336 (4.7%) were other or multiracial, and 2859 (39.9%) were White (per the NHANES data collection protocol). A cross-validated, deep learning classifier was constructed that achieved fair performance predicting SSRI use (area under the curve, 0.67 [95% CI, 0.64-0.71] for the validation set and 0.66 [95% CI, 0.64-0.68] for the test set). To account for possible confounding by indication, we constructed a parallel model incorporating depression severity, finding only marginal performance improvement. When averaged across individuals and across 7 days, the results show less overall movement in the SSRI group (mean, 120.1 vertical acceleration counts/min [95% CI, 115.7-124.6 vertical acceleration counts/min]) (continued) Key Points Question What can digital technologies and deep learning indicate about the association between the use of antidepressants and abnormal physical movement patterns? Findings This cross-sectional study found a significant association between antidepressant use and measured movement, even when accounting for depression. Individuals treated with antidepressants had an overal...

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Section: Methodsmentioning

confidence: 89%

Association of Selective Serotonin Reuptake Inhibitor Use With Abnormal Physical Movement Patterns as Detected Using a Piezoelectric Accelerometer and Deep Learning in a Nationally Representative Sample of Noninstitutionalized Persons in the US

et al. 2022

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“…This effect has also been noted for copper deposition in aqueous systems. 40 Using this revised value, N m and N p values could be recalculated for each pulse conditions used in the BTA trials. In most instances N m ≈ 0.9-1.1, and N p = 1.1 under all conditions.…”

Section: Resultsmentioning

confidence: 99%

Pulse Electrodeposition of Copper in the Presence of a Corrosion Reaction

Green

Roy

2021

J. Electrochem. Soc.

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This study has examined the pulse electrodeposition of copper from a deep eutectic solvent.Pulse plating parameters were selected using the methodologies originally developed for aqueous solutions, including constraints arising from double layer charging and mass transport effects. Although copper could be deposited under nearly all conditions, in many instances only partial plating was observed and current efficiencies were low. This effect was greatest at low duty cycles and/or when the off-time was long. This phenomenon was attributed to a corrosion (comproportionation) reaction occurring in the off-time. A simple model based on the corrosion reaction being under cathodic mass transport control was developed. While this could explain the main effects, it predicted a corrosion rate that was typically higher than observed. A variety of other models were then explored, the most plausible one indicating that the corrosion rate in the off-time is being controlled by a slow chemical dissolution step. This explained the main observations and predicts that, only for long pulse periods when steady-state conditions are approached, is the corrosion rate under cathodic mass transport control. Finally, it was found that benzotriazole could be employed to substantially reduce the corrosion rate and allow higher current efficiencies to be obtained.

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“…25,26 The use of benzotriazole as a corrosion inhibitor for Cu and Co is notable. 12,15,[27][28][29][30] Therefore, the removal rates of Cu and Co polishing using slurry comprising of 2 wt%, NaOCl, 2 wt% silica and 5 mM BTA as inhibitor are further studied.…”

Section: Resultsmentioning

confidence: 99%

Formulation of Sodium Hypochlorite Based Slurry for Copper-Cobalt Chemical Mechanical Planarization Process

Hazarika

Rajaraman

2020

ECS J. Solid State Sci. Technol.

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Chemical mechanical planarization of interconnect metal copper and barrier metal cobalt using NaOCl based slurry is investigated in this study. The slurry consists of 2 wt% silica, 0.5 wt% NaOCl and 5 mM BTA as inhibitor. The formulated slurry gives a combination of low etch rates and comparatively fair removal rates along with selectivity of ∼1:1.006 at pH 9, which are desired to be used in semiconductor industry. A decrease in removal rates for both Cu and Co is observed as the pH regime changes from acidic to alkaline. At acidic pH, the passive layer if any formed on the surface becomes very unstable resulting in higher polish rates. However, at neutral and alkaline medium, the passivation layer comprising of Co (II) oxide/hydroxides is formed which subsequently decreases the polish rate. A highly stable and dense passivation layer of Co (III) oxides comprising of mostly Co 3 O 4 and CoOOH is formed at the highly alkaline region explaining the reason behind lower removal rates. The variation in turntable speed and down force pressure does not have any significant impact on selectivity obtained at optimum conditions. XRD analysis reveals the formation of oxide on Co surface after etching at pH 9.

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Untitled

Cited by 13 publications

References 26 publications

Association of Selective Serotonin Reuptake Inhibitor Use With Abnormal Physical Movement Patterns as Detected Using a Piezoelectric Accelerometer and Deep Learning in a Nationally Representative Sample of Noninstitutionalized Persons in the US

Association of Selective Serotonin Reuptake Inhibitor Use With Abnormal Physical Movement Patterns as Detected Using a Piezoelectric Accelerometer and Deep Learning in a Nationally Representative Sample of Noninstitutionalized Persons in the US

Pulse Electrodeposition of Copper in the Presence of a Corrosion Reaction

Formulation of Sodium Hypochlorite Based Slurry for Copper-Cobalt Chemical Mechanical Planarization Process

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