2-kHz repetition rate XeF laser

Wang, C.; Gibb, O. L.

doi:10.1109/jqe.1979.1070019

Cited by 23 publications

(4 citation statements)

References 14 publications

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“…Efforts have been made to achieve these improvements, but serious technical problems remain unsolved. [1][2][3][4][5][6] It is necessary to enhance the utility of excimer laser in the various practical applications for which high speed and low-cost processing is required.…”

Section: Introductionmentioning

confidence: 99%

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Development of key components and technologies for a high repetition rate and high-power excimer laser

Goto

Takagi

Kakizaki

et al. 1998

Review of Scientific Instruments

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Articles you may be interested inThe influence of the pulse length on the drilling of metals with an excimer laser Key components and technologies have been developed for an ultrahigh repetition rate XeCl excimer laser of 5 kHz to be used for industrial applications. A compact axial blower having a revolution rate of up to 10 000 min Ϫ1 and a maximum pressure of 16.2 kPa in air was made with a canned magnetic coupler to circulate a laser gas at a flow velocity of over 150 m/s in a discharge region. Materials constituting a laser chamber were tested to prevent discharge instability by gas contamination to enable long time operation. The dominant cause of the instability was investigated by a simple simulation. For a preionization, a novel sealed-off x-ray tube was developed to compare the suitability in a high repetition rate operation with that of conventional UV preionization. The gas due to the shock and acoustic waves generated by discharge pulses was measured to design the damper, which enabled the suppression of the gas turbulence by around a tenth. To simplify cumbersome laser maintenance, a new power supply provided by a novel fast switching semiconductor device was evaluated by operating the laser. The experimental laser apparatus integrating these key components and technologies was operated to confirm the practical availability for high repetition of up to 5 kHz. Many kinds of basic experiments have been performed to increase repetition rate, average power, and reliability. Though these experimental results have not yet been integrated and performed simultaneously, we have achieved operation up to an average output power of 0.56 kW at 5 kHz. Based on the results and empirical knowledge, the prospect for a practical high repetition rate excimer laser was discussed.

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Section: Introductionmentioning

confidence: 99%

“…[1][2][3][4][5][6][7] We also have published several reports on the development of the HRR excimer laser, [8][9][10][11] and reported that up to 5 kHz XeCl laser was operated steadily with an output power of more than 0.5 kW. 12 At the same time, we developed the key components and technologies for the HRR laser.…”

Section: Introductionmentioning

confidence: 99%

Development of key components and technologies for a high repetition rate and high-power excimer laser

Goto

Takagi

Kakizaki

et al. 1998

Review of Scientific Instruments

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“…[4][5][6] In the course of the EU-REKA program, it was reported that 1 kHz XeCl laser at an output of 200 W increased its repetition to 1.7 kHz in a burst mode operation. The final target, which was to demonstrate more than 5 kHz operation with an average output a͒ Present address: Dept.…”

Section: Introductionmentioning

confidence: 99%

Design concept and performance considerations for fast high power semiconductor switching for high repetition rate and high power excimer laser

Goto

Kakizaki

Takagi

et al. 1997

Review of Scientific Instruments

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Development of key components and technologies for a high repetition rate and high-power excimer laser Rev.A high current, battery-operated power supply with power control through an on-off fast switch Rev.A semiconductor switching power supply has been developed, in which a novel structure semiconductor device, metal-oxide-semiconductor assisted gate-triggered thyristor ͑MAGT͒ was incorporated with a single stage magnetic pulse compression circuit ͑MPC͒. The MAGT was specially designed to directly replace thyratrons in a power supply for a high repetition rate laser. Compared with conventional high power semiconductor switching devices, it was designed to enable a fast switching, retaining a high blocking voltage and to extremely reduce the transient turn-on power losses, enduring a higher peak current. A maximum peak current density of 32 kA/cm 2 and a current density risetime rate di/dt of 142 kA/͑cm 2 ϫs͒ were obtained at the chip area with an applied anode voltage of 1.5 kV. A MAGT switching unit connecting 32 MAGTs in series was capable of switching on more than 25 kV-300 A at a repetition rate of 5 kHz, which, coupled with the MPC, was equivalent to the capability of a high power thyratron. A high repetition rate and high power XeCl excimer laser was excited by the power supply. The results confirmed the stable laser operation of a repetition rate of up to 5 kHz, the world record to our knowledge. An average output power of 0.56 kW was obtained at 5 kHz where the shortage of the total discharge current was subjoined by a conventional power supply with seven parallel switching thyratrons, simultaneously working, for the MAGT power supply could not switch a greater current than that switched by one thyratron. It was confirmed by those excitations that the MAGT unit with the MPC could replace a high power commercial thyratron directly for excimer lasers. The switching stability was significantly superior to that of the thyratron in a high repetition rate region, judging from the discharge current wave forms. It should be possible for the MAGT unit, in the future, to directly switch the discharge current within a rise time of 0.1 s with a magnetic assist.

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“…At present, average output powers from 10 W to 200 W have been obtained by several researchers from transverse flow RGH lasers, with closed cycle or blowdown configurations [1][2][3][4][5][6][7]. The operating characteristics of these systems have shown that more than 5 gas replacements in the discharge volume between pulses are required to maintain the máximum energy per pulse.…”

Section: Introductionmentioning

confidence: 99%

High repetition rate effects in XeCl tea lasers

Buffa¹,

Burlamacchi²,

Matera³

et al. 1982

Optics Communications

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The high repetition rate capability of a discharge pumped XeCl láser with static fill has been studied by double pulse experiments. By suitably selecting the láser parameters (energy deposition, gas mixture composition, filling pressure), following an analytical model of the discharge induced thermal effects, láser action from the second pulse for delays as short as 5 ms with an energy of 12.5 mJ has been achieved.

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2-kHz repetition rate XeF laser

Cited by 23 publications

References 14 publications

Development of key components and technologies for a high repetition rate and high-power excimer laser

Development of key components and technologies for a high repetition rate and high-power excimer laser

Design concept and performance considerations for fast high power semiconductor switching for high repetition rate and high power excimer laser

High repetition rate effects in XeCl tea lasers

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