2007
DOI: 10.1109/jstqe.2007.905133
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20 Gb/s 85$^{\circ}$C Error-Free Operation of VCSELs Based on Submonolayer Deposition of Quantum Dots

Abstract: 980 nm vertical-cavity surface-emitting lasers based on submonolayer growth of quantum dots show clearly open eyes and operate error free with bit error rates better than 10 −12 at 25 and 85 • C for 20 Gb/s without current adjustment. The peak differential efficiency only reduces from 0.71 to 0.61 W/A between 25 and 85 • C; the maximum output power at 25 • C is above 10 mW.

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Cited by 62 publications
(42 citation statements)
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“…First and foremost, a proof-ofprinciple that QDs are viable gain elements for SDLs was needed. Investigations started with a target emission of ∼ 1 μm, a wavelength where proven high-performance operation of edge emitters and VCSELs had already been achieved [81][82][83]. The constraints imposed here are marginally different from the ones associated with the design of QW-based SDLs.…”
Section: Nm-1100 Nm Sdlsmentioning
confidence: 99%
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“…First and foremost, a proof-ofprinciple that QDs are viable gain elements for SDLs was needed. Investigations started with a target emission of ∼ 1 μm, a wavelength where proven high-performance operation of edge emitters and VCSELs had already been achieved [81][82][83]. The constraints imposed here are marginally different from the ones associated with the design of QW-based SDLs.…”
Section: Nm-1100 Nm Sdlsmentioning
confidence: 99%
“…18), were deemed the most promising since they offer a large ground-state gain and they can be grown with good size uniformity at high densities (∼ 10 11 /cm 2 ) with a minimum stacking distance of 20 nm [82,83]. Their true 3-dimensional confinement should also provide easy population inversion and good thermal immunity.…”
Section: Nm-1100 Nm Sdlsmentioning
confidence: 99%
“…All processing for this device was performed by my former colleague Alex Mutig as described in [Hop07]. Selective oxidation of the Al-rich aperture layer was done using optimized conditions as described in ref.…”
Section: Processing and Characterizationmentioning
confidence: 99%
“…Processing and characterization of edge emitters was carried out by Kristijan Posilovic and Thorsten Kettler. Electro-optically modulated vertical emitters were processed by Alex Mutig using standard lithography techniques as detailed in [Hop07]. Device performance measurements were performed by Alexey Nadtochiy and Sergey Blokhin.…”
Section: A5 Processing and Device Characterizationmentioning
confidence: 99%
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