2013
DOI: 10.1016/j.egypro.2013.07.274
|View full text |Cite
|
Sign up to set email alerts
|

22.0% Efficient Laser Doped back Contact Solar Cells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

1
22
0

Year Published

2014
2014
2024
2024

Publication Types

Select...
9

Relationship

4
5

Authors

Journals

citations
Cited by 28 publications
(23 citation statements)
references
References 5 publications
1
22
0
Order By: Relevance
“…Furthermore, the duration of the etch back adjusts the phosphorus concentration in the FSF. Passivation: After RCA cleaning, dry thermal oxidation around T = 1000 °C drives‐in the dopants and grows a silicon oxide which serves as a surface passivation layer. PECVD silicon nitride SiN x on the front side serves as anti‐reflection coating (ARC). Dielectric layers: From this step on, the solar cell process changes compared to the previously published process flow . Instead of SiN x we use a stack of PECVD SiO x and SiC x to increase the light‐trapping and isolate the metallization from the wafer. Laser step 3 (contact opening): Figure (c) illustrates the local laser ablation of the dielectric layer to define the contact areas, utilizing a 35 ns pulsed, frequency tripled Nd:YAG laser, emitting at a wavelength λ = 355 nm.…”
Section: Solar Cell Manufacturing Processmentioning
confidence: 99%
“…Furthermore, the duration of the etch back adjusts the phosphorus concentration in the FSF. Passivation: After RCA cleaning, dry thermal oxidation around T = 1000 °C drives‐in the dopants and grows a silicon oxide which serves as a surface passivation layer. PECVD silicon nitride SiN x on the front side serves as anti‐reflection coating (ARC). Dielectric layers: From this step on, the solar cell process changes compared to the previously published process flow . Instead of SiN x we use a stack of PECVD SiO x and SiC x to increase the light‐trapping and isolate the metallization from the wafer. Laser step 3 (contact opening): Figure (c) illustrates the local laser ablation of the dielectric layer to define the contact areas, utilizing a 35 ns pulsed, frequency tripled Nd:YAG laser, emitting at a wavelength λ = 355 nm.…”
Section: Solar Cell Manufacturing Processmentioning
confidence: 99%
“…Some approaches for industrial interdigitated back contact solar cells (IBC) are published [1][2][3], but still, mainly due to the higher production costs, the market share of IBC solar cells is quite low. We recently presented laser doped back contact solar cells metallized with evaporated and photo-lithographic structured contacts with η = 22.0% [4]. To further reduce the production cost and make the whole process more industrial relevant, we apply standard screen-printed contacts and reach η = 21.4%.…”
Section: Introductionmentioning
confidence: 99%
“…Scanning the wafer surface enables doping of arbitrarily shaped areas. This paper presents our record laser-doped back-contact solar cell with an efficiency η = 22.0% [19]. First, the principles of laser doping and the solar cell manufacturing process are described.…”
Section: Introductionmentioning
confidence: 99%