2013
DOI: 10.1117/12.2004521
|View full text |Cite
|
Sign up to set email alerts
|

28 Gb/s 850 nm oxide VCSEL development at Avago

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2015
2015
2022
2022

Publication Types

Select...
2
2

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 5 publications
0
1
0
Order By: Relevance
“…Table 2 shows that most GaN-VCSELs use a cavity length (distance between the DBRs) of about 7λ or even longer. GaAs-VCSELs, on the other hand, use a shorter cavity length, even as short as 0.5λ, to improve transport and optical confinement in order to push the high-speed performance [137][138][139] . There are several reasons for using longer cavity lengths in GaN-VCSELs.…”
Section: Cavity Lengthmentioning
confidence: 99%
“…Table 2 shows that most GaN-VCSELs use a cavity length (distance between the DBRs) of about 7λ or even longer. GaAs-VCSELs, on the other hand, use a shorter cavity length, even as short as 0.5λ, to improve transport and optical confinement in order to push the high-speed performance [137][138][139] . There are several reasons for using longer cavity lengths in GaN-VCSELs.…”
Section: Cavity Lengthmentioning
confidence: 99%