2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography

Yun, Taeyeong; Jin, Hyeong Min; Kim, Dong‐Ha; Han, Kyu Hyo; Yang, Geon Gug; Lee, Gil Yong; Lee, Gang San; Choi, Jin Young; Kim, Il‐Doo; Kim, Sang Ouk

doi:10.1002/adfm.201804508

Cited by 43 publications

(43 citation statements)

References 54 publications

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“…In this respect, dots and stripes, two basic elements of lithographic patterns, can be obtained from BCP thin films featuring cylinders and lamellae perpendicularly oriented with respect to the substrate . Thus, the control of the domain orientation represents an essential key for the technological application of these materials in lithographic processes.…”

Section: Introductionmentioning

confidence: 99%

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis

Caligiore¹,

Nazzari

Cianci³

et al. 2019

Adv Materials Inter

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than simply decorating the surface. [2][3][4] SIS allows transforming polymers into organic-inorganic hybrid materials: penetration and reaction of gaseous metal precursors into polymer, during SIS, permit to grow inorganic materials into polymeric films [5] in order to tune some of their features as their optical properties or improve their chemical etch resistance. [6][7][8][9] The SIS process is characterized by two factors: diffusion and entrapment of precursor molecules into the polymer matrix. The most direct method to promote their entrapment is the chemical reaction of penetrant molecules with polymer functional groups in combination with a secondary precursor (coreactant). [4] Thus, the number of reactive sites within the polymer film plays an important role in the determination of the amount of inorganic material grown in the film during the process. Moreover, differently from ALD, the self-terminating reactions are not restricted to the surface sites. Precursor molecules must diffuse into the polymeric film to reach the reactive sites that are distributed in the volume of the polymeric matrix. Consequently, diffusion plays a fundamental part in the kinetics of the infiltration process and needs to be monitored in real time. The most used in situ techniques for investigating the infiltration mechanism are in situ quartz crystal microbalance (QCM) measurements and in situ Fourier transform infrared (FTIR) spectroscopy. [10][11][12][13] In situ dynamic spectroscopic ellipsometry (SE) was recently validated as a valuable tool for real time investigation of the infiltration process in poly(methyl methacrylate) (PMMA) and polystyrene (PS) homopolymers. [14] In situ SE is a noninvasive optical technique frequently used in combination with ALD processes [15][16][17] and for studies of polymer films under several conditions. [18][19][20] During SIS process, in situ SE allows continuous acquisition of information about changes of thickness and refractive index (n) of polymer films without interrupting the process itself on a shorter time scale than in situ FTIR spectroscopic analysis and without the need of ad hoc samples as for QCM measurements. When SIS is performed into self-assembled block copolymers (BCP), [21] the selective binding of precursors to one domain only of BCPs offers the possibility to fabricate inorganic functional nanoarchitectures [22] or hard masks for lithography. [23] Removing polymers by O 2 plasma after Sequential infiltration synthesis (SIS) consists in a controlled sequence of metal organic precursors and coreactant vapor exposure cycles of polymer films. Two aspects characterize an SIS process: precursor molecule diffusion within the polymer matrix and precursor molecule entrapment into polymer films via chemical reaction. In this paper, SIS process for the alumina synthesis is investigated using trimethylaluminum (TMA) and H 2 O in thin films of poly(styrene-random-methyl methacrylate) (P(S-r-MMA)) with variable MMA content. The amount of alumina grown in the P(S-r-MMA) films linear...

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Section: Introductionmentioning

confidence: 99%

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis

Caligiore¹,

Nazzari

Cianci³

et al. 2019

Adv Materials Inter

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“…After perforation, the relative intensities of the in-plane and out-of-plane vibrations (E 1 2g /A 1g ) decreased from 0.802 for the pristine to 0.613 for the nanomesh MoS 2 . The lowering of E 1 2g /A 1g in the nanomesh MoS 2 supports the presence of the newly generated nanoholes and increase in the edge sites, because A 1g vibration is preferentially excited to the E 1 2g vibration for edge-terminated lms 22,23 . Figure 2f shows XPS analysis of the nanomesh and pristine MoS 2 lms with regard to their Mo 3d core levels.…”

Section: Nano-scale Patterning Of Multilayer Mosmentioning

confidence: 59%

Nanomesh-patterning on multilayer MoS2 field-effect transistors for ultra-sensitive detection of cortisol

Park

Baek

Jeong

et al. 2020

Preprint

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Absence of functional groups on the basal plane of molybdenum disulfide (MoS2) significantly hinders the performance of MoS2 field-effect transistor-based biosensor (bio-FET). We present a novel method for creating nano-scale holes on a MoS2 channel using block copolymer lithography, where the edge areas on the nanoholes were used to form covalent linkage between the capture molecules of cortisol aptamer and the MoS2 channel. The comparative analysis of Raman and XPS spectra well supported the formation of the nanoholes on MoS2 together with the concomitant increase in the edge area. The performance of the nanomesh bio-FET was studied by comparing its detection behavior for cortisol with that of a bio-FET manufactured with pristine MoS2. The nanomesh MoS2 bio-FET detected cortisol 109 times as low as that by the pristine MoS2 bio-FET. The selectivity of the nanomesh bio-FET was validated by detection experiments with other steroid hormones and antigens. Additionally, clinical applicability was demonstrated by performing experiments in artificial saliva and human serum.

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“…As a result, BCP templates made from materials such as poly(cyclohexylethylene)- b -poly(lactide) [ 242 ], polystyrene- b -poly(2-vinyl pyridine) [ 233 , 245 ], polystyrene- b -polymethyl methacrylate [ 238 , 246 ], polystyrene- b -polydimethylsiloxane [ 239 , 247 , 248 ], or others [ 205 ] lead to the fabrication of a large variety of versatile surface relief patterns of different material nature. Examples include (metal) nanodots [ 240 , 249 , 250 ], bimetallic NP arrays [ 251 ], perovskite cylinders, lamellae or cylindrical mesh [ 245 ], 2D metal/silicon nanowires [ 206 , 249 ], metal oxide arrays [ 242 ] of nanorods [ 244 ] or nanorings [ 243 ], and more [ 205 , 252 ].…”

Section: Bottom–up Lithographic Methodologiesmentioning

confidence: 99%

“…Once the polymer matrix is removed from the Pt-infiltrated BCP thin films by etching, various conductive Pt structures can be obtained [ 233 ] ( Figure 12 g). Of course, all patterns transferred with the above methods can further be employed in various applications in nanoengineering [ 246 , 249 , 251 , 252 ], quantum technology [ 247 ], or optoelectronics [ 237 ] in order, for example, to manufacture high-performance tribological generators [ 252 ], transistor circuitry [ 206 ], masks for lithographic purpose [ 206 , 253 ], photonic nanostructures [ 240 , 248 ], etc.…”

Section: Bottom–up Lithographic Methodologiesmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

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2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography

Cited by 43 publications

References 54 publications

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis

Nanomesh-patterning on multilayer MoS2 field-effect transistors for ultra-sensitive detection of cortisol

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

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2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography

Cited by 43 publications

References 54 publications

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al2O3 Growth by Sequential Infiltration Synthesis

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al2O3 Growth by Sequential Infiltration Synthesis

Nanomesh-patterning on multilayer MoS2 field-effect transistors for ultra-sensitive detection of cortisol

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

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Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis

Effect of the Density of Reactive Sites in P(S‐r‐MMA) Film during Al₂O₃ Growth by Sequential Infiltration Synthesis