2019
DOI: 10.1109/jstqe.2019.2908790
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300-mm Monolithic Silicon Photonics Foundry Technology

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Cited by 209 publications
(91 citation statements)
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“…The device Si can act as a waveguiding core as it has larger refractive index than its surrounding silicon dioxide (SiO 2 ) or silicon nitride (SiN) materials. The material platform, most notably specified by the thickness of the device silicon, has gradually come to a consensus of around 220 nm [17][18][19][20][21] though some variations exist for better integration with transistors [22] or for more tolerable optical performance [23,24]. SiN, commonly found in many CMOS processes, can also act as a waveguiding material in Si photonics.…”
Section: Waveguiding Materialsmentioning
confidence: 99%
“…The device Si can act as a waveguiding core as it has larger refractive index than its surrounding silicon dioxide (SiO 2 ) or silicon nitride (SiN) materials. The material platform, most notably specified by the thickness of the device silicon, has gradually come to a consensus of around 220 nm [17][18][19][20][21] though some variations exist for better integration with transistors [22] or for more tolerable optical performance [23,24]. SiN, commonly found in many CMOS processes, can also act as a waveguiding material in Si photonics.…”
Section: Waveguiding Materialsmentioning
confidence: 99%
“…The black and red data points and axis represent the static modulation efficiency as a function of the f 3dB bandwidth and the dynamic modulation efficiency (extracted from eye-diagrams) as a function of the modulation speed, respectively. The red, blue and green data clouds enclose single- 11,12,34,38 and double-layer [8][9][10]35 graphene and silicon- [39][40][41] state-of-the-art modulators operating at λ = 1.55 µm. Refer to sections XV and XVI in SI for a more detailed comparison of graphene-based modulators.…”
Section: Resultsmentioning
confidence: 99%
“…A third tradeoff is an additional area on the chip required for the bond pads needed to connect to the four PDs. This can be mitigated by implementing the receiver in a monolithic process, such as the one offered by GlobalFoundries, Santa Clara, CA, USA [21], where bond pads are not needed, similar to the work presented in [5]. The reported area of PDs in SiP is 25 μm × 8 μm in [22], which is negligible in this case.…”
Section: Comparison With the State-of-the-artmentioning
confidence: 99%