355-nm, nanosecond laser mirror thin film damage competition

Negres, Raluca A.; Stolz, Christopher J.; Thomas, Michael; Caputo, Mark

doi:10.1117/12.2279981

Cited by 8 publications

(1 citation statement)

References 3 publications

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“…The result showed that 12 out of 30 total samples submitted had a threshold of at least 20 J/cm 2 for damage initiation of stable defects. In 2017, damage competition examined 355 nm HR mirror coating with 45 o Angle-Of-Incidence (AOI) and P-polarization [6]. From that study, using raster scan test, coating samples from participating vendors showed damage threshold ranging from 1 J/cm 2 to 14 J/cm 2 , with 6 out of 35 submitted samples having LIDT of at least 10 J/cm 2 .…”

Section: Damage Threat To Beam Transport Optics: High Energy Long Pulsementioning

confidence: 99%

Optical damage considerations in the design of the matter in extreme condition upgrade (MEC-U) laser systems

Yang,

Greenberg,

Cunningham

et al. 2023

Laser-Induced Damage in Optical Materials 2023

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Section: Damage Threat To Beam Transport Optics: High Energy Long Pulsementioning

confidence: 99%

Optical damage considerations in the design of the matter in extreme condition upgrade (MEC-U) laser systems

Yang,

Greenberg,

Cunningham

et al. 2023

Laser-Induced Damage in Optical Materials 2023

Self Cite

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Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods

Peters

Qiu

Harthcock

et al. 2021

Journal of Applied Physics

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Laser-induced damage in coating materials with a high index of refraction, such as hafnia, limits the performance of high power and high energy laser systems. Understanding the underlying physics responsible for laser damage holds the key for developing damage-resistant optical films. Previous studies have reported a substantial difference in laser damage onset for hafnia films produced by different deposition methods, yet the underlying mechanisms for the observed difference remain elusive. We combined laser damage testing with analytical characterizations and theoretical simulations to investigate the response of hafnia films produced by electron (e-) beam evaporation vs ion beam sputtering (IBS) methods upon UV ns-laser exposure. We found that e-beam produced hafnia films were overall more damage resistant; in addition, we observed a polarization anisotropy associated with the onset of damage in the e-beam films, while this effect was absent in the latter films. The observed differences can be attributed to the stark contrast in the pressure inside the pores inherent in both films. The high pressure inside the IBS-induced nanobubbles has been shown to reduce the threshold for laser-induced plasma breakdown leading to film damage. The polarization effects in the e-beam coatings can be related to the asymmetric electric field intensification induced by the columnar void structure. Our findings provide a fundamental basis for developing strategies to produce laser damage-resistant coatings for UV pulsed laser applications.

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Ten-year summary of the Boulder Damage Symposium annual thin film laser damage competition

Stolz

Negres

2018

Opt. Eng.

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355-nm, nanosecond laser mirror thin film damage competition

Cited by 8 publications

References 3 publications

Optical damage considerations in the design of the matter in extreme condition upgrade (MEC-U) laser systems

Optical damage considerations in the design of the matter in extreme condition upgrade (MEC-U) laser systems

Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods

Ten-year summary of the Boulder Damage Symposium annual thin film laser damage competition

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