365nm-Light-sensitive photobase generators derived from trans-o-coumaric acid

Arimitsu, Koji; Oguri, Ayaka; Furutani, Masahiro

doi:10.1016/j.matlet.2014.11.001

Cited by 17 publications

(7 citation statements)

References 17 publications

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“…However, contrary to many other photoresponsive surfactant systems, the fatty acid-PAG systems presented here are not reversible [2]. The only possibility to obtain reversible systems from PAG would be to add the appropriate Photobase generator (PBG) to the system, which would increase solution pH upon light irradiation at other wavelengths [47].…”

Section: Resultsmentioning

confidence: 91%

pH-responsive fatty acid self-assembly transition induced by UV light

Arnould

Gaillard

Fameau

2015

Journal of Colloid and Interface Science

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Section: Resultsmentioning

confidence: 91%

pH-responsive fatty acid self-assembly transition induced by UV light

Arnould

Gaillard

Fameau

2015

Journal of Colloid and Interface Science

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“…To achieve spatial-temporal control, several photobase generators have been developed and their performance in various thiolate mediated click reactions has been extensively studied in recent years. , Ideally, an efficient photobase generator should have a suitable chromophore for good absorption at a desired wavelength and should be able to produce active species in high yield upon photoexcitation. Thioxanthone, trans- o -coumaric acid, o -acyloxyime, pthalimidocarbamates, α-ketocarbamates, and o -nitrobenzyl carbamates are a few among the well-known chromophores used for this purpose. In general, highly efficient photobase generators are often necessary to achieve the thiolate mediated click reactions efficiently.…”

Section: Photoclick Reactionsmentioning

confidence: 99%

Photoclick Chemistry: A Bright Idea

et al. 2021

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At its basic conceptualization, photoclick chemistry embodies a collection of click reactions that are performed via the application of light. The emergence of this concept has had diverse impact over a broad range of chemical and biological research due to the spatiotemporal control, high selectivity, and excellent product yields afforded by the combination of light and click chemistry. While the reactions designated as “photoclick” have many important features in common, each has its own particular combination of advantages and shortcomings. A more extensive realization of the potential of this chemistry requires a broader understanding of the physical and chemical characteristics of the specific reactions. This review discusses the features of the most frequently employed photoclick reactions reported in the literature: photomediated azide–alkyne cycloadditions, other 1,3-dipolarcycloadditions, Diels–Alder and inverse electron demand Diels–Alder additions, radical alternating addition chain transfer additions, and nucleophilic additions. Applications of these reactions in a variety of chemical syntheses, materials chemistry, and biological contexts are surveyed, with particular attention paid to the respective strengths and limitations of each reaction and how that reaction benefits from its combination with light. Finally, challenges to broader employment of these reactions are discussed, along with strategies and opportunities to mitigate such obstacles.

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“…Although photosensitive materials based on base‐catalyzed reactions have merit in preventing erosion of metallic substrates, PBGs generally have lower quantum yields than PAGs . Recently, to improve photosensitivity, some studies regarding PBGs with high quantum yields have been reported but they have not yet been applied to photopatterning materials . There are a few reports concerning photopatterning materials based on epoxy resins utilizing PBGs.…”

Section: Introductionmentioning

confidence: 99%

Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base‐catalyzed cross‐linking reactions

Terada

Furutani

Arimitsu

2018

Polymers for Advanced Techs

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Most of the photopatterning materials based on epoxy resins utilize photoacid generators (PAGs), which generate superacids as catalysts. They have been used for high aspect ratio photoresists in the fabrication of MEMS devices. However, there is a drawback, in that the acidic species from PAGs will induce metal corrosion. One of the approaches to overcome this problem is the use of photobase generators (PBGs) because organic bases would induce no corrosion. Although there have been many previous investigations of PBGs, only a few articles have mentioned photoreactive materials relying on PBGs because of their low photosensitivity. We report here highly sensitive photopatterning materials comprising PBGs and an epoxy resin bearing carboxylic acid groups. As a result, the photopatterning materials showed higher photosensitivity than conventional epoxy resin systems. We obtained highphotosensitivity (up to 900 mJ/cm 2 ), high-resolution (10-μm line-and-space) patterning materials in films, 10 μm in thickness.

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365nm-Light-sensitive photobase generators derived from trans-o-coumaric acid

Cited by 17 publications

References 17 publications

pH-responsive fatty acid self-assembly transition induced by UV light

pH-responsive fatty acid self-assembly transition induced by UV light

Photoclick Chemistry: A Bright Idea

Photoresist materials comprising photobase generators and epoxy resins bearing carboxylic acids to lead to marked enhancement of base‐catalyzed cross‐linking reactions

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