“…While several strategies have been developed for surface patterning, including embossing, etching and lithography, 6 they often bring the disadvantage of requiring post-processing treatments, which add to the overall cost and time of fabrication. 10 In contrast, when used in conjunction with materials designed to exhibit specific functionalities, surface patterning can prove a promising tool that can enhance performance for a wide range of practical applications, 11 including tandem polymer OLEDs, bulk heterojunction photovoltaic cells, 12 sub-micrometer channels in field effect transistors, 13 resist patterning of PMMA or PEDOT leading to the formation of mesoscale patterns for radio frequency ID tags, 14 templated biological micro-electro-mechanical systems, 15 and templated plasmonic structures. 7,8 Spontaneous surface patterning is a result of instabilities in the film caused by the difference of surface energy between the film and the substrate, or phase segregation in the case of spinodal dewetting of multi-component systems.…”