“…4,5 Hence, the cost of a wafer is reduced signicantly and, most importantly, 3C-SiC is compatible with conventional N/MEMS technologies. 6,7 The proper metallization of any device is very important to obtain exact and accurate responses. However, the metallization of MEMS devices generally requires multiple timeconsuming processes (i.e., lithography and metal etching), expensive metal sources (e.g., Au, Ni, Al, and Ti), and specialized equipment, such as sputters and electron beam evaporators.…”