3D Microlithography Using an Integrated System of 5-mm UV-LEDs with a Tilt-Rotational Sample Holder

Abstract

This paper demonstrates a 3D microlithography system where an array of 5 mm Ultra Violet-Light Emitting Diode (UV-LED) acts as a light source. The unit of the light source is a UV-LED, which comes with a length of about 8.9 mm and a diameter of 5 mm. The whole light source comprises 20 × 20 matrix of such 5 mm UV-LEDs giving a total number of 400 LEDs which makes it a very favorable source with a large area for having a batch production of the desired microstructures. This light source is able to give a level of precision in microfabrication which cannot be obtained using commercial 3D printers. The whole light source performs continuous rotational movement once it is turned on. This can also move up and down in a vertical direction. This multidirectional light source also comprises a multidirectional sample holder. The light source teaming up with the multidirectional sample holder highly facilitates the process of fabrication of a huge range of 3D structures. This article also describes the different levels of characterization of the system and demonstrates several fabricated 3D microstructures including high aspect ratio vertical micro towers, twisted turbine structures, triangles, inclined pillar ‘V’ structures, and hollow horn structures as well.

Editorial for the Special Issue on the ICAE 2019

“…In this Special Issue, 10 technical papers are published on piezoelectric devices [ 1 , 2 , 3 , 4 ], biomedical devices [ 5 , 6 ], micromachining [ 7 , 8 ], and complementary metal-oxide-semiconductor (CMOS) logic devices [ 9 , 10 ]. For the piezoelectric devices, high-density piezoelectric micromachined ultrasonic transducer array based on patterned aluminum nitride thin film is introduced for imaging application [ 1 ].…”

“…A three-dimensional (3D) microlithography system with ultraviolet-LED (UV-LED) and low-temperature thin-film encapsulation using silicon nitride thin films are presented for the work on micromachining [ 7 , 8 ]. Computer-controlled UV-LED lithography was implemented for 3D microfabrication with an array of UV-LED and a tilt-rotational sample holder for 3D light traces [ 7 ].…”

“…A three-dimensional (3D) microlithography system with ultraviolet-LED (UV-LED) and low-temperature thin-film encapsulation using silicon nitride thin films are presented for the work on micromachining [ 7 , 8 ]. Computer-controlled UV-LED lithography was implemented for 3D microfabrication with an array of UV-LED and a tilt-rotational sample holder for 3D light traces [ 7 ]. Reference [ 8 ] investigates the role of an argon fluoride excimer laser beam with 193 nm wavelength in depositing silicon nitride thin films by laser-assisted plasma-enhanced chemical vapor deposition based on silane–ammonia gas mixtures toward encapsulation of polyethylene–naphthalate flexible substrates [ 8 ].…”