3D OPC method for GLV parallel scanning lithography microstructure topography control based on SinCUT

Abstract

A 3D optical proximity correction (OPC) optimization method based on single image contrastive unpaired translation (SinCUT) is proposed for the precise fabrication of 3D microstructures in GLV parallel scanning digital 3D lithography. This method is applied to the optimized fabrication of hyperbolic micro-convex lens arrays. Its fabrication accuracy is demonstrated, showing a significant reduction in the mean square error (MSE) of the morphology. When the lens height is 8.5 µm, the average height error of the lens shape is less than 5%, and the MSE is reduced from 0.727 to 0.0329, resulting in a reduction rate of 92.79%.