3D-printed multilayer structures for high–numerical aperture achromatic metalenses

Pan, Cheng-Feng; Wang, Hao; Wang, Hongtao; S, Parvathi Nair; Ruan, Qifeng; Wredh, Simon; Ke, Yujie; Chan, John You En; Zhang, Wang; Qiu, Cheng-Wei; Yang, Joel K. W.

doi:10.1126/sciadv.adj9262

Cited by 24 publications

(3 citation statements)

References 61 publications

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“…Moreover, employing a 3D printer, researchers introduced a novel design for multilayer achromatic metalens and multilayer meta-optics [depicted in Figs. 15(e) and 15(f)] [305,306] . They utilized topology optimization and after etching (middle column).…”

Section: Multilayer Dielectric Metasurface Nanofabricationmentioning

confidence: 99%

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Advanced manufacturing of dielectric meta-devices

Yang,

Zhou,

Tsai

et al. 2024

Photonics Insights

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Metasurfaces, composed of two-dimensional nanostructures, exhibit remarkable capabilities in shaping wavefronts, encompassing phase, amplitude, and polarization. This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics, culminating in the development of flat and ultrathin optical devices. Particularly noteworthy is the all-dielectric-based metasurface, leveraging materials such as titanium dioxide, silicon, gallium arsenide, and silicon nitride, which finds extensive application in the design and implementation of high-performance optical devices, owing to its notable advantages, including a high refractive index, low ohmic loss, and cost-effectiveness. Furthermore, the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication, especially through wafer-scale nanofabrication technologies, thereby facilitating the realization of commercial applications for metasurfaces. This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas. These technologies, including standard nanolithography [e.g., electron beam lithography (EBL) and focused ion beam (FIB) lithography], advanced nanolithography (e.g., grayscale and scanning probe lithography), and large-scale nanolithography [e.g., nanoimprint and deep ultraviolet (DUV) lithography], are utilized to fabricate highresolution, high-aspect-ratio, flexible, multilayer, slanted, and wafer-scale all-dielectric metasurfaces with intricate nanostructures. Ultimately, we conclude with a perspective on current cutting-edge nanofabrication technologies.

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Section: Multilayer Dielectric Metasurface Nanofabricationmentioning

confidence: 99%

“…The right SEM image offers an enlarged view of the full MAM and sectioned MAM. [305] (f) Inverse-designed multilayered metaoptics using 3D printing, implemented in a low-index polymer. The SEM of the measured sample is displayed in the right panel.…”

Section: Slanted Dielectric Metasurface Nanofabricationmentioning

confidence: 99%

Advanced manufacturing of dielectric meta-devices

Yang,

Zhou,

Tsai

et al. 2024

Photonics Insights

View full text Add to dashboard Cite

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“…It is expected to furnish researchers with a comprehensive review that allows them to grasp the foundational knowledge and recent advancements, fostering a thorough understanding of this field. Finally, leveraging TPL's high-resolution processing abilities, extensive material processing range, and genuine 3D processing capabilities, in conjunction with recent progress in new materials [25][26][27][28], fabrication technologies [29], and design methodologies [30], we discuss potential solutions to current challenges and prognosticate the prospects of TPL in the realm of imaging optics. Although TPL offers numerous advantages over traditional fabrication methods, its application in industrial production is still in its infancy and confronted with various limitations like suitable materials and direct fabrication speed.…”

Section: Introductionmentioning

confidence: 99%

Two-photon polymerization lithography for imaging optics

Wang,

Pan,

et al. 2024

Int. J. Extrem. Manuf.

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Optical imaging systems have greatly extended human visual capabilities, enabling the observation and understanding of diverse phenomena. Imaging technologies span a broad spectrum of wavelengths from X-ray to radio frequencies and impact research activities and our daily lives. Traditional glass lenses are fabricated through a series of complex processes, while polymers offer versatility and ease of production. However, modern applications often require complex lens assemblies, driving the need for miniaturization and advanced designs with micro- and nanoscale features to surpass the capabilities of traditional fabrication methods. Three-dimensional (3D) printing, or additive manufacturing, presents a solution to these challenges with benefits of rapid prototyping, customized geometries, and efficient production, particularly suited for miniaturized optical imaging devices. Various 3D printing methods have demonstrated advantages over traditional counterparts, yet challenges remain in achieving nanoscale resolutions. Two-photon polymerization lithography (TPL), a nanoscale 3D printing technique, enables the fabrication of intricate structures beyond the optical diffraction limit via the nonlinear process of two-photon absorption within liquid resin. It offers unprecedented abilities, e.g., alignment-free fabrication, micro- and nanoscale capabilities, and rapid prototyping of almost arbitrary complex 3D nanostructures. In this review, we emphasize the importance of the criteria for optical performance evaluation of imaging devices, discuss material properties relevant to TPL, fabrication techniques, and highlight the application of TPL in optical imaging. As the first panoramic review on this topic, it will equip researchers with foundational knowledge and recent advancements of TPL for imaging optics, promoting a deeper understanding of the field. By leveraging on its high-resolution capability, extensive material range, and true 3D processing, alongside advances in materials, fabrication, and design, we envisage disruptive solutions to current challenges and a promising incorporation of TPL in future optical imaging applications.

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High‐Quality Micropattern Printing by Complex‐Amplitude Modulation Holographic Femtosecond Laser

Li,

Jiang,

Wang

et al. 2024

Advanced Optical Materials

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Holographic femtosecond laser printing technology is widely used in the fabrication of micropatterns because of its high efficiency and flexibility. However, speckle noise and energy fluctuations limit the quality of the printed structure. In this study, an improved complex‐amplitude modulation holographic femtosecond laser printing method for high‐quality micropattern fabrication is proposed. The holographic light field is divided into a signal area and a surrounding noise area. To improve laser uniformity, phase modulation is applied in the signal region to eliminate the speckle noise caused by unconstrained phase interference, and weighted amplitude modulation is introduced in the signal area to improve the calculation accuracy. To precisely control laser energy density, weighted energy efficiency modulation is introduced in the noise region to disperse the energy that exceeds the material damage threshold. Under the synergistic control of laser uniformity and energy density, high‐quality micro‐pattern structures are printed efficiently. A high‐quality millimeter‐sized multifocal zone plate with micron accuracy is fabricated with the splicing printing method, demonstrating the potential of micropattern processing and the fabrication of functional devices such as binary optics.

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3D-printed multilayer structures for high–numerical aperture achromatic metalenses

Cited by 24 publications

References 61 publications

Advanced manufacturing of dielectric meta-devices

Advanced manufacturing of dielectric meta-devices

Two-photon polymerization lithography for imaging optics

High‐Quality Micropattern Printing by Complex‐Amplitude Modulation Holographic Femtosecond Laser

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