5. The Role of Sulfur Compounds in Coloring and Melting Kinetics of Industrial Glass

Design and synthesis of multifaceted dicyanomethylene rhodanine linked thiophene: a SnOx–perovskite dual interface modifier facilitating enhanced device performance through improved Fermi level alignment, defect passivation and reduced energy loss

“…For this purpose, around 0.05 wt% sulfur compounds are typically used, which matches well with our SnO x thin film EDX sulfur mapping data. 38 XPS analysis of the bare SnO x thin film reveals no S 2p peaks (Fig. S12b†) within the detection range and it confirms that the observed sulfur (0.02 wt%) content in SnO x (in EDX mapping) indeed originates only from the glass substrate.…”