“…After this, a 150‐nm Mo was deposited and patterned as the source/drain electrodes, followed by the deposition of PECVD SiO 2 layer as the passivation layer. An IZO layer is deposited and patterned to form the pixel electrode, anode for OLED . Then, to form the transparent OLED stack, 1,4,5,8,9,11‐hexaazatriphenylene‐hexacarbonitrile (HAT‐CN) (20 nm) as a hole injection layer, N , N ′‐di(naphthalene‐1‐yl)‐ N , N ′‐diphenylbenzidine (NPB) (50 nm) as a hole transport layer, 4,4′,4′‐tris(carbazol‐9‐yl)‐triphenylamine (TCTA) (5 nm) as an exciton blocking layer, TCTA:2,2′,2′‐(1,3,5‐benzenetriyl)‐tris‐[1‐phenyl‐1‐H‐benzimidazole] (TPBi):12% tris(2‐phenylpyridinato‐C2, N )iridium(III) (Ir(ppy) 3 ) (15 nm) as an emission layer, TPBi (45 nm) as an electron transport layer, and LiF (0.5 nm)/Al (1 nm)/Ag (22 nm) as a transparent cathode.…”