59‐1: Invited Paper: Scaling Down of OLED Pixels Enabled by Photolithography

Abstract

This paper discusses the advantages of OLEDs in pixel scaling and the novel device structures enabled by photolithography. We show the pixel layouts that can be realized by photolithographic patterning, i.e., delta and color strip pixel layout with high pixel density. Further integration of OPD next to an OLED pixel is discussed. Finally, we show the OLED performance after three times OLED patterning steps, which is crucial for the full‐color OLED display realized by photolithography patterning processes. The results suggest that the photolithography patterning process could be a powerful method to further enhance the AMOLED display performance.

P‐210: Photolithography Patterning of Organic Light‐Emitting Diodes Using Solvent Resistant Electron Transport Materials

“…[1] While the selective deposition of organic molecules through the Fine Metal Mask (FMM) method serves as a mass production technique for mobile panels, it encounters constraints in realizing ultra-highresolution pixels for VR and AR displays, primarily attributed to physical limitations such as mask sagging phenomena. [2] To achieve technological advancement and commercialization through the production of realistic, high-resolution displays, it is imperative to develop non-printing pixel formation techniques that do not depend on the FMM method. In this paper, we aim to achieve a high-resolution technology tailored for VR and AR displays by adopting the photolithography method for OLED pixel patterning.…”

P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography

“…In addition, the deposition of electroluminescent (EL) materials on the mask will probably cause shadowing. Several studies have reported on the technology of forming OLEDs without a fine metal mask [2,3]. In this work, we employ our developed metal mask-less lithography (MML) technology that provides a high-aperture ratio patterned organic semiconductor (HarPOS) to separate the RGB subpixels, thereby achieving an ultrafine SBS patterning of real pixels, in each of which the RGB subpixels are formed [4][5][6], instead of a PenTile pattern.…”