Diffusion in Semiconductors
DOI: 10.1007/10426818_15
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6 Grain-boundary and dislocation diffusion in semiconductors and silicides

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“…Copper was introduced as a heater material instead of platinum [1,2] to reduce costs and process complexity (aqua regia etch step is difficult). However, the use of copper bears some problems: copper diffuses into silicon and silicon dioxide [10,11]. A diffusion barrier is required in order to protect the silicon dioxide isolation layer 9 .…”
Section: Chip Fabricationmentioning
confidence: 99%
“…Copper was introduced as a heater material instead of platinum [1,2] to reduce costs and process complexity (aqua regia etch step is difficult). However, the use of copper bears some problems: copper diffuses into silicon and silicon dioxide [10,11]. A diffusion barrier is required in order to protect the silicon dioxide isolation layer 9 .…”
Section: Chip Fabricationmentioning
confidence: 99%