77.3: <i>Invited Paper</i>: Roll‐to‐Roll Manufacturing of Backplanes for Paper‐Like Displays

Taussig, Carl; Cobene, Robert; Elder, Richard; Jackson, Warren B.; Jam, Mehrban; Jeans, Albert; Luo, Hao; Maltabes, John G.; Mei, Ping; Smith, Mark D.; Perlov, Craig; Zhao, Lihua; Almanza-Workman, Marcia; Garcia, Robert; Kim, Hanjun; Kwon, O–Kyun; Jeffrey, F. R.

doi:10.1889/1.3499870

Cited by 6 publications

(2 citation statements)

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“…Although a number of methods for mass production of the rollable OLED displays have been studied, there are still no established manufacturing technologies. Since rollable displays use plastic-based substrates, it is expected that the manufacturing process becomes more difficult and the production cost will astronomically go up as the size of the display increases [3]. In this study, we have studied a roll-to-roll (R2R) backplane process technology for the rollable displays which can realize high resolution, low cost, and high throughput.…”

Section: Introductionmentioning

confidence: 99%

Advanced Top-Down Fabrication Process of A-IGZO TFT for Roll-to-Roll Backplane

Kim

Choi²,

Kim³

et al. 2018

IEICE Trans. Electron.

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Amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistor (TFT) was fabricated by an advanced self-aligned imprint lithography (ASAIL) method with a hybrid etching process. The SAIL is a top-down method to fabricate a TFT using a three-dimensional multilayer etch mask having all pattern information for the TFT. The hybrid etching process was newly applied in the original SAIL process for the purpose of reducing plasma damage of a-IGZO channel layer during plasma etching in the ASAIL process. This research demonstrated that the a-IGZO TFT could be successfully fabricated by the ASAIL process. In particular, the hybrid etching process applied in this paper can be utilized for the back-channeletch type a-IGZO TFT and further extended for the roll-to-roll backplane process.

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Section: Introductionmentioning

confidence: 99%

Advanced Top-Down Fabrication Process of A-IGZO TFT for Roll-to-Roll Backplane

Kim

Choi²,

Kim³

et al. 2018

IEICE Trans. Electron.

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“…1 Recent work has investigated devices requiring metal etching in conjunction with imprint lithography, but again at a micron scale. 2 However, R2R patterning of arbitrary patterns with thin residual layer control (needed for subsequent pattern transfer) at the nanoscale is far more challenging, particularly at a cost structure suited for commodity applications. The challenge is to create a process that is scalable and meets defectivity, throughput, and cost of ownership requirements.…”

Section: Introductionmentioning

confidence: 99%

High-performance wire-grid polarizers using jet and Flash™ imprint lithography

Ahn¹,

Yang²,

Miller³

et al. 2013

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Extremely large-area roll-to-roll (R2R) manufacturing on flexible substrates is ubiquitous for applications such as paper and plastic processing. It combines the benefits of high speed and inexpensive substrates to deliver a commodity product at low cost. The challenge is to extend this approach to the realm of nanopatterning and realize similar benefits. In order to achieve low-cost nanopatterning, it is imperative to move toward high-speed imprinting, less complex tools, near zero waste of consumables, and low-cost substrates. We have developed a roll-based J-FIL process and applied it to a technology demonstrator tool, the LithoFlex 100, to fabricate large-area flexible bilayer wire-grid polarizers (WGPs) and high-performance WGPs on rigid glass substrates. Extinction ratios of better than 10,000 are obtained for the glass-based WGPs. Two simulation packages are also employed to understand the effects of pitch, aluminum thickness, and pattern defectivity on the optical performance of the WGP devices. It is determined that the WGPs can be influenced by both clear and opaque defects in the gratings; however, the defect densities are relaxed relative to the requirements of a high-density semiconductor device. © The Authors. Published by SPIE under a Creative Commons IntroductionThe ability to pattern materials at the nanoscale can enable a variety of applications ranging from high-density data storage, displays, photonic devices and complementary metaloxide-semiconductor integrated circuits to emerging applications in the biomedical and energy sectors. These applications require varying levels of pattern control, short-and long-range order, and have varying cost tolerances.Roll-to-roll (R2R) printing or web printing involves the patterning of flexible materials such as plastics or metal foils. The flexible material, or web, is unwound from a core, processed, and then returned to a second core at the end of the sequence. R2R processing is in use today by industry and many R2R processes already exist for etch and deposition. Lithographic processes are also established for micron-scale manufacturing and for applications that only require polymer embossing without any subsequent processing.1 Recent work has investigated devices requiring metal etching in conjunction with imprint lithography, but again at a micron scale.2 However, R2R patterning of arbitrary patterns with thin residual layer control (needed for subsequent pattern transfer) at the nanoscale is far more challenging, particularly at a cost structure suited for commodity applications. The challenge is to create a process that is scalable and meets defectivity, throughput, and cost of ownership requirements.The cost of manufacturing is typically driven by speed (or throughput), tool complexity, cost of consumables (materials used, mold or master cost, etc.), substrate cost, and the downstream processing required (annealing, deposition, etching,

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Flexible Displays: Substrate and TFT Technology Options and Processing Strategies

Sarma¹

2016

Handbook of Visual Display Technology

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77.3: Invited Paper: Roll‐to‐Roll Manufacturing of Backplanes for Paper‐Like Displays

Cited by 6 publications

References 0 publications

Advanced Top-Down Fabrication Process of A-IGZO TFT for Roll-to-Roll Backplane

Advanced Top-Down Fabrication Process of A-IGZO TFT for Roll-to-Roll Backplane

High-performance wire-grid polarizers using jet and Flash™ imprint lithography

Flexible Displays: Substrate and TFT Technology Options and Processing Strategies

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