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Kostic̆, I.; Andok, Robert; Barák, Vojtěch; Caplovic, I.; Konecnikova, A.; Matay, L.; Hrkut, P.; Ritomsky, A.

doi:10.1023/a:1026198130745

Cited by 9 publications

(3 citation statements)

References 17 publications

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“…However, photomasks require maskless techniques to fabricate. The technologies used to fabricate photomasks include direct laser writer (DLW), focused ion beam (FIB), and electron beam lithographic (EBL) systems . Among these technologies, DLW provides the lowest price and relatively high throughput.…”

Section: Introductionmentioning

confidence: 99%

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Hong

2020

Laser & Photonics Reviews

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Photolithography is one of the most commonly used techniques in semiconductor manufacturing, which is the foundation for all the modern electronic device fabrication. However, deep and extreme ultraviolet lithographic systems as well as the corresponding photomasks are both relatively expensive. The fabrication methods are based on the low‐speed high‐cost electron‐beam lithography or focused‐ion‐beam etching. Therefore, a maskless high‐speed method is highly recommended for the micro/nano‐structure fabrication. Among all these maskless methods, direct laser writing (DLW) is an important and widely adopted micro‐processing technique. Based on the nonlinear exposure, the feature size can achieve down to tens of nanometers. However, the speed of DLW is a technical bottleneck. To overcome this issue, parallel DLW methods are developed, including the self‐assembly microspheres laser patterning, laser interference lithography, and multifocal array DLW. Herein, the principles, advantages, challenges, and applications of these parallel processing technologies are summarized. Nanoscale resolution for large area arbitrary periodic pattern fabrication is achieved. Meanwhile, these technologies have the unique ability to build 3D structures instead of conventional 2D patterns, which is the direction of future micro/nano‐fabrication. These techniques are widely applied to surface processing and functional device fabrication in the field of sensing, solar cells, and metamaterials.

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Section: Introductionmentioning

confidence: 99%

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Hong

2020

Laser & Photonics Reviews

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“…Several methods of nanolithography, including E-beam lithography, nanoimprint lithography and ion beam lithography, are the most common techniques for fabricating nano patterns [10,11]. However, these methods have low output and high cost, which limits their applications for producing nanostructures with a high density and large areas [12,13]. Moreover, it is necessary to control the size and shape of the nanoparticle in order to obtain the desired properties.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of nanopatterns using block copolymer and controlling surface morphology

Alam

Lee

Kim

et al. 2010

Journal of Colloid and Interface Science

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“…Several methods for nanolithography including e-beam lithography, nanoimprinting, and focused-ion-beam lithography have been used as the most common techniques to fabricate sub-50 nm patterns [4,5]. However, these methods have low throughput and high cost that limits their application for producing nanostructures with high densities and large areas [6,7]. In this study, polymer lithography using block copolymer process was proposed for solving these problems.…”

Section: Introductionmentioning

confidence: 99%