2000
DOI: 10.1023/a:1006779126522
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Cited by 6 publications
(2 citation statements)
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“…Binary silica–germania glasses exhibit low optical dispersion and the potential for second-harmonic generation . SiO 2 –GeO 2 glass is commonly prepared by melt quench requiring high-temperature processing of viscous molten liquids or layered structures by chemical vapor deposition, limiting glass formation and application. Sol–gel formation of silica–germania glasses and thin films has been previously reported by cohydrolyzing germanium and silicon alkoxide precursors under acidic conditions. However, this approach is typically limited to casting-type applications as sols rapidly undergo gelation to form an extended oxide network, instead of stable colloidal sols. Furthermore, with cohydrolysis of Ge- and Si-alkoxide mixtures, the control of compositional speciation is limited …”
Section: Introductionmentioning
confidence: 99%
“…Binary silica–germania glasses exhibit low optical dispersion and the potential for second-harmonic generation . SiO 2 –GeO 2 glass is commonly prepared by melt quench requiring high-temperature processing of viscous molten liquids or layered structures by chemical vapor deposition, limiting glass formation and application. Sol–gel formation of silica–germania glasses and thin films has been previously reported by cohydrolyzing germanium and silicon alkoxide precursors under acidic conditions. However, this approach is typically limited to casting-type applications as sols rapidly undergo gelation to form an extended oxide network, instead of stable colloidal sols. Furthermore, with cohydrolysis of Ge- and Si-alkoxide mixtures, the control of compositional speciation is limited …”
Section: Introductionmentioning
confidence: 99%
“…Hence, the sol-gel technique has been employed to synthesize germanosilicate thin films. Alkoxides such as tetraethyl orthogermanate (TEOG) and tetraethylorthosilicate (TEOS) were selected as precursors for germania and silica, respectively [17][18][19][20][21][22][23]. Junji Niahii et al prepared a 4.6 µm-thick germanosilicate film containing up to 50 mol % germanium oxide by the sputtering deposition method.…”
Section: Introductionmentioning
confidence: 99%