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Cited by 3 publications
(8 citation statements)
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“…The testing n -channel MISFET element based on a Pd–Ta 2 O 5 –SiO 2 –Si structure was fabricated on a single chip (2 × 2 mm 2 ) together with a ( p–n )-junction temperature sensor and heater-resistor by means of conventional n -MOS-technology using laser evaporation Pd-films. Technological processes are presented in detail in [11,17]. Photos of the fragment of the silicon wafer undivided into chips and the separate chip are shown in Figure 1.…”
Section: Methodsmentioning
confidence: 99%
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“…The testing n -channel MISFET element based on a Pd–Ta 2 O 5 –SiO 2 –Si structure was fabricated on a single chip (2 × 2 mm 2 ) together with a ( p–n )-junction temperature sensor and heater-resistor by means of conventional n -MOS-technology using laser evaporation Pd-films. Technological processes are presented in detail in [11,17]. Photos of the fragment of the silicon wafer undivided into chips and the separate chip are shown in Figure 1.…”
Section: Methodsmentioning
confidence: 99%
“…The gas sensors based on MIS-capacitors and field-effect transistors (MISFETs) have been studied by many investigators (e.g., [2,3,4,5,6,7,8,9,10,11,12,13,14,15,16,17]). A great contribution to the developments of gas-sensitive MIS devices has been made by the researchers at Linköping University since their first work in 1975 [2].…”
Section: Introductionmentioning
confidence: 99%
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