2020 IEEE International Electron Devices Meeting (IEDM) 2020
DOI: 10.1109/iedm13553.2020.9371922
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A 14 nm Embedded STT-MRAM CMOS Technology

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Cited by 35 publications
(12 citation statements)
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“…5 Université de Lorraine, CNRS, IJL, Nancy, France. 6 Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120, Palaiseau, France. *Corresponding author.…”
Section: Introductionunclassified
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“…5 Université de Lorraine, CNRS, IJL, Nancy, France. 6 Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120, Palaiseau, France. *Corresponding author.…”
Section: Introductionunclassified
“…In recent years, spintronics (1-3) has gained considerable attention and shows great promise for low-power, nonvolatile memory technology. While magnetic memory devices based on spin-transfer torque (STT) have already been introduced to the market (4)(5)(6), they still present some challenges such as device lifetime (10 10 write cycles limited by tunnel barrier breakdown), relatively slow switching speed and the write error rate (due to the stochastic thermal fluctuation induced switching initiation), which are affecting its performance compared to the state-of-the-art semiconductor memory devices (3,4). Spin-orbit torque (SOT)-based devices, on the other hand, are expected to largely overcome these problems.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, the recent developments of embedding memory elements in the early back-end-of-line (BEOL) of the manufacturing process demand advanced materials and dimensional metrology very late in the process that was previously not required. 1 In particular, there is now a significant need for optical critical dimension (OCD) metrology during these later stages of device manufacturing. 2 The most advanced back-end memory devices are embedded between the first and second metal levels on top of frontend complementary metal-oxide-semiconductor (CMOS) logic.…”
Section: Introductionmentioning
confidence: 99%
“…4 In this paper, scatterometry challenges are discussed, and one approach that helps to overcome some of the shortcomings of the model-based optical technique is presented in more detail. VTS capabilities for three different BEOL examples are demonstrated: (i) measuring critical dimensions (CDs) of a first metal level on top of nanosheet gate-all-around (NS-GAA) transistor structures, 5,6 (ii) measuring the thickness of an interlayer dielectric (ILD) above embedded memory in the active area, 1 and (iii) measuring CDs of trenches on top of tall stacks in the micrometer range comprising many layered dielectrics. In addition, the significantly improved prediction capabilities of VTS trained machine learning models over traditional approaches are shown.…”
Section: Introductionmentioning
confidence: 99%
“…HE magnetic tunnel junction (MTJ) has been widely used in non-volatile random access memory, logic devices, and unconventional computing because of its benefits, e.g., nanosecond speed operation, scalability, thermal stability, high endurance, and compatibility with CMOS [1][2][3][4][5]. More recently, the MTJ is being studied as a probabilistic-bit circuit element due to its thermally-driven magnetization dynamics [6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%