We present operation concepts and performance characteristics of novel microwave devices and structures using Oxide-AlGaN/GaN Heterostructures with multiple capacitivelycoupled contacts (C 3 ). The C 3 electrodes do not require annealing and, hence, such devices with tight electrode spacing can be fabricated using a self-aligned process. To illustrate the advantages of C 3 -technology, we demonstrate multi-gate C 3 -RF switches, RF switches with side control electrodes and novel RF-TLM test structures for layer and contact parameter extraction.