A 326 nm pure ultraviolet light sources achieved in a Ga<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si107.svg" display="inline" id="d1e525"><mml:msub><mml:mrow/><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:math>O<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si108.svg" display="inline" id="d1e533"><mml:msub><mml:mrow/><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:math> microwire heterojunction through interface optimization and surface-modificatio

Sun, Lingling; Han, Jiajia; Lu, Yifan; Meng, Ming; Li, Binghui; Li, Jitao; Jiang, Mingming

doi:10.1016/j.surfin.2024.105273

Surfaces and Interfaces

2024

DOI: 10.1016/j.surfin.2024.105273

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A 326 nm pure ultraviolet light sources achieved in a Ga2O3 microwire heterojunction through interface optimization and surface-modificatio

Lingling Sun,

Jiajia Han,

Yifan Lu

et al.

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A 326 nm pure ultraviolet light sources achieved in a Ga2O3 microwire heterojunction through interface optimization and surface-modificatio

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References 63 publications

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