A 4.7‐inch 650 PPI AMQLED display prepared by direct photolithography

Abstract

In this work, a highly efficient photosensitive quantum dot (QD) system was designed. The optimized photosensitive QD system had high photoluminescence quantum yield and colloidal stability. By direct photolithography, RGB pixel arrays with a single sub‐pixel size of 39 μm × 5 μm were successfully prepared. Further, the full‐color QLED device was realized. There were no residual QD emission peaks from neighboring sub‐pixels observed in the electroluminescence spectra. Experience on the full‐color QLED device guided the successful preparation of a 4.7‐inch 650 PPI active matrix QLED prototype. The active matrix QLED prototype could display clear and complete pictures. The color gamut reached 85% of the BT2020 standard. This is the first active matrix QLED prototype prepared with a record‐high resolution by direct photolithography, which promoted the development of QLED display technology.