2015 Symposium on VLSI Technology (VLSI Technology) 2015
DOI: 10.1109/vlsit.2015.7223707
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A 50-nm 1.2-V Ge<inf>x</inf>Te<inf>1&#x2212;x</inf>/Sb<inf>2</inf>Te<inf>3</inf> superlattice topological-switching random-access memory (TRAM)

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Cited by 4 publications
(6 citation statements)
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“…Until 2015 there was a dominant belief in a switching mechanism where Ge atomic planes at the interface between GeTe and Sb 2 Te 3 would show a kind of collective umbrella flip, with only debate about the details of such flip . Then a paper was published directly showing that GeTe–Sb 2 Te 3 superlattices reconfigure into alternating GST and Sb 2 Te 3 when grown at a usual temperature of 230 °C and completely reconfigure into the stable (trigonal) crystal structure of GST when annealed at 400 °C .…”
Section: Resultsmentioning
confidence: 99%
“…Until 2015 there was a dominant belief in a switching mechanism where Ge atomic planes at the interface between GeTe and Sb 2 Te 3 would show a kind of collective umbrella flip, with only debate about the details of such flip . Then a paper was published directly showing that GeTe–Sb 2 Te 3 superlattices reconfigure into alternating GST and Sb 2 Te 3 when grown at a usual temperature of 230 °C and completely reconfigure into the stable (trigonal) crystal structure of GST when annealed at 400 °C .…”
Section: Resultsmentioning
confidence: 99%
“…[14][15][16] Thus, the GeTe layers are sandwiched between thicker Sb 2 Te 3 layer than the primitive cell. Table I and Fig.…”
Section: Simulation Methods and Modelmentioning
confidence: 99%
“…In an actual iPCM, the Sb 2 Te 3 layer in the superlattice is 4 nm thick, which is four times greater than the thickness of a primitive cell in a GeTe= Sb 2 Te 3 superlattice. 12,[14][15][16] Moreover, the GeTe=Sb 2 Te 3 superlattice is grown on a thicker Sb 2 Te 3 layer (5 nm). [14][15][16] Thus, the GeTe layers are sandwiched between thicker Sb 2 Te 3 layer than the primitive cell.…”
Section: Simulation Methods and Modelmentioning
confidence: 99%
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