2004
DOI: 10.1016/j.jcrysgro.2003.12.035
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A brief history of defect formation, segregation, faceting, and twinning in melt-grown semiconductors

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Cited by 107 publications
(66 citation statements)
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“…21 It has also been suggested that the planar defects such as twins can cost energy ͑although very small͒. 28 The facts that ͑i͒ GaSb nanowires have been fully relaxed where the strain energy= 0 ͑when ignoring the transition region near the GaAs/ GaSb interface͒ and ͑ii͒ no lattice defects in GaSb nanowires ͑where the defects associated energy= 0͒ suggest that the system energy for GaSb nanowires reaches its minimum. This indicates that the growth of GaSb is governed by thermodynamics, in which each growth step requires the system to reach a minimum energy state.…”
Section: ͑1͒mentioning
confidence: 99%
“…21 It has also been suggested that the planar defects such as twins can cost energy ͑although very small͒. 28 The facts that ͑i͒ GaSb nanowires have been fully relaxed where the strain energy= 0 ͑when ignoring the transition region near the GaAs/ GaSb interface͒ and ͑ii͒ no lattice defects in GaSb nanowires ͑where the defects associated energy= 0͒ suggest that the system energy for GaSb nanowires reaches its minimum. This indicates that the growth of GaSb is governed by thermodynamics, in which each growth step requires the system to reach a minimum energy state.…”
Section: ͑1͒mentioning
confidence: 99%
“…For Si a very high level of perfection has been achieved, with vanishingly low defect densities. 1 In compound semiconductors, the problem is more complex since, in addition to vacancies and interstitial defects, antisite defects may also occur. The relative concentrations of the defects as well as their charge states determine the Fermi level position.…”
Section: Introductionmentioning
confidence: 99%
“…Various references for impurity distribution or segregation include. [105][106][107][108][109] Silicon crystals grown by the Czochralski method tends to be contaminated by oxygen. Silicon may be contaminated by various impurities during crystal growth or subsequent processing.…”
Section: History Of Semiconductor Crystal Growth Technologymentioning
confidence: 99%