A bright continuous-wave laser source at 193 nm

Scholz, Matthias; Opalevs, Dmitrijs; Leisching, P.; Kaenders, Wilhelm; Wang, Guiling; Wang, Xiaoyang; Li, Rukang; Chen, Chuangtian

doi:10.1063/1.4817786

Cited by 35 publications

(23 citation statements)

References 21 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…To overcome the space charge effect, it is desirable to increase the repetition rate of the laser light sources in order to reduce the number of photons in one pulse. Development of continuous-wave laser light will be most ideal because in principle it does not produce space charge effect[37,55,183]. The continuous-wave laser light may become particularly useful for spin-resolved ARPES where high photon flux is necessary in order to compensate the low efficiency of spin detectors which will inevitably causes strong space charge effect if it is a pulsed laser light source.Spatially-resolved ARPES will play an important role in studying inhomogeneous systems.…”

mentioning

confidence: 99%

New developments in laser-based photoemission spectroscopy and its scientific applications: a key issues review

Zhou¹,

He²,

Liu³

et al. 2018

Rep. Prog. Phys.

124

View full text Add to dashboard Cite

The significant progress in angle-resolved photoemission spectroscopy (ARPES) in last three decades has elevated it from a traditional band mapping tool to a precise probe of many-body interactions and dynamics of quasiparticles in complex quantum systems. The recent developments of deep ultraviolet (DUV, including ultraviolet and vacuum ultraviolet) laser-based ARPES have further pushed this technique to a new level. In this paper, we review some latest developments in DUV laser-based photoemission systems, including the super-high energy and momentum resolution ARPES, the spin-resolved ARPES, the time-of-flight ARPES, and the time-resolved ARPES. We also highlight some scientific applications in the study of electronic structure in unconventional superconductors and topological materials using these state-of-the-art DUV laser-based ARPES. Finally we provide our perspectives on the future directions in the development of laser-based photoemission systems.

show abstract

mentioning

confidence: 99%

New developments in laser-based photoemission spectroscopy and its scientific applications: a key issues review

Zhou¹,

He²,

Liu³

et al. 2018

Rep. Prog. Phys.

124

View full text Add to dashboard Cite

show abstract

“…In 2012, S. Ito et al presented a 0.2 W 193-nm laser by SHG in KBBF with nanoseconds pulse which is suitable for seeding the ArF laser [30]. In addition, CW DUV laser at 193 nm was reported by M. Scholz et al with the output power of 15 mW in KBBF by SHG with which the fundamental laser was from an external cavity laser [27].…”

Section: Duv Laser At 193 Nmmentioning

confidence: 99%

High-Power, Solid-State, Deep Ultraviolet Laser Generation

Xuan

Igarashi²,

Ito

et al. 2018

Applied Sciences

View full text Add to dashboard Cite

At present, deep ultraviolet (DUV) lasers at the wavelength of fourth harmonics of 1 µm (266 nm/258 nm) and at the wavelength of 193 nm are widely utilized in science and industry. We review the generation of these DUV lasers by nonlinear frequency conversion processes using solid-state/fiber lasers as the fundamental frequency. A DUV laser at 258 nm by fourth harmonics generation (FHG) could achieve an average power of 10 W with a beam quality of M 2 < 1.5. Moreover, 1 W of average power at 193 nm was obtained by sum-frequency generation (SFG). A new concept of 193-nm DUV laser generation by use of the diamond Raman laser is also introduced. A proof-of-principle experiment of the diamond Raman laser is reported with the conversion efficiency of 23% from the pump to the second Stokes wavelength, which implies the potential to generate a higher power 193 nm DUV laser in the future.Yb:YAG laser at 1030 nm using the CLBO crystal [13]. This laser would lead to a better laser machining result compared to the previous DUV lasers with larger M 2 .

show abstract

“…1, the technical details are explained in Ref. [6][7][8]. The seed laser is a TOPTICA DL pro laser system at 772 nm and a linewidth of less than 50 kHz.…”

Section: Laser Design and Experimental Setupmentioning

confidence: 99%

“…The first experiments to achieve CW laser radiation around 193 nm with KBBF crystals were based on TOPTICA's scientific laser systems without crystal optics shifter [6][7][8]. In scientific DUV semiconductor based CW systems, the lifetime in the DUV is generally limited by the degradation of the surface and bulk volume of the optical parts of the system.…”

Section: Lifetime and Environmental Measurementsmentioning

confidence: 99%

See 1 more Smart Citation

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Opalevs

Scholz

Stühler

et al. 2018

Solid State Lasers XXVII: Technology and Devices

Self Cite

View full text Add to dashboard Cite

We present a novel industrial-grade prototype version of a continuous-wave 193 nm laser system entirely based on solid state pump laser technology. Deep-ultraviolet emission is realized by frequency-quadrupling an amplified diode laser and up to 20 mW of optical power were generated using the nonlinear crystal KBBF. We demonstrate the lifetime of the laser system for different output power levels and environmental conditions. The high stability of our setup was proven in > 500 h measurements on a single spot, a crystal shifter multiplies the lifetime to match industrial requirements. This laser improves the relative intensity noise, brilliance, wall-plug efficiency and maintenance cost significantly. We discuss first lithographic experiments making use of this improvement in photon efficiency.

show abstract

A bright continuous-wave laser source at 193 nm

Cited by 35 publications

References 21 publications

New developments in laser-based photoemission spectroscopy and its scientific applications: a key issues review

New developments in laser-based photoemission spectroscopy and its scientific applications: a key issues review

High-Power, Solid-State, Deep Ultraviolet Laser Generation

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

Contact Info

Product

Resources

About