The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts.
DOI: 10.1109/plasma.2003.1229953
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a-C:F:H film with low k and high thermal stability deposited by electron cyclotron resonance chemical vapor deposition at room temperature

Yunzi Xin1,
Shuyan Xu2,
C. Ye3
et al.
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