“…The standard exposure protocol adopted for each measurement consists basically of three steps: (a) the baseline, during which only the carrier gas is fluxed with the aim of stabilizing the current; (b) the exposure window to the target gas; and (c) the recovery phase, during which the analyte flow is stopped and again only the carrier gas is fluxed in order to return the device to the initial conditions (Figs. 1-2) Ricciardella et al, 2014). The devices were tested at three different steps: as soon as prepared, after about one month, during which they were exposed in air, and finally after applying the two described restoring methods, namely the device annealing at 130 • C in vacuum for 120 min and the newly developed method that encompasses the dipping of exhaust devices into ultrapure water at 100 • C for 60 s, followed by a drying step on the hot plate at 150 • C for 5 min.…”