A case study of statistical process control on the prime process using PLASMASK 302U

Arshak, K.; McDonagh, D.; Braddell, Jules; Murphy, Eamonn; Gleeson, Peggy

doi:10.1016/0026-2714(95)90087-7

Cited by 2 publications

(1 citation statement)

References 9 publications

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“…An experimental design technique was used to choose the process parameter settings for the simulations and the PRIME process experiments [14]. The process parameters that are varied include the e-beam dose, the NUV flood dose and the silylation temperature.…”

Section: The Effect Of the Prime Process Parameters On The Dry Develomentioning

confidence: 99%

<title>Modeling and simulation of the PRIME process using the SLITS simulator</title>

McDonagh

Arshak

et al. 1995

SPIE Proceedings

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In this paper, a new method to calculate the silylation profile in the PRIME process is presented. New software modules have been added to the 2D simulator SLITS in order to simulate the silylation and dry developed profiles in the PRIME process. The silylation and dry developed profiles for the PRIME process are simulated and compared to experimental results. Simulations were carried out for both e-beam and DUV exposures. Under e-beam exposure, the maximum percentage error between the simulated and experimental results was 13%. Under DIN exposure, the silylation depth at the mask edge can be reduced by increasing the dose thus effectively controlling the resist linewidth. The depth of focus was found to be O.4jtm. In order to model the DUV/NUV exposure of the resist, the 2D simulator SLiTS is used to obtain the aerial and latent images. The aerial image is solved using Hopkin's Theory of partial coherence imaging [12]. The latent image formation is modelled by solving the Helmholtz equation on a two-dimensional domain using the finite element method O-8194-1786-G/95/$6.OO SPIE Vol. 2438 / 817 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 06/28/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspx

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Section: The Effect Of the Prime Process Parameters On The Dry Develomentioning

confidence: 99%

<title>Modeling and simulation of the PRIME process using the SLITS simulator</title>

McDonagh

Arshak

et al. 1995

SPIE Proceedings

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show abstract

SLITS simulator: modeling and simulation of e‐beam/deep‐ultraviolet exposure and silylation

McDonagh¹,

Arshak

et al. 1996

Opt. Eng

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A case study of statistical process control on the prime process using PLASMASK 302U

Cited by 2 publications

References 9 publications

<title>Modeling and simulation of the PRIME process using the SLITS simulator</title>

<title>Modeling and simulation of the PRIME process using the SLITS simulator</title>

SLITS simulator: modeling and simulation of e‐beam/deep‐ultraviolet exposure and silylation

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