A chemical reaction and influence of flood-exposure light wavelength on REL. Resolution enhanced lithography.

Abstract

The chemical formation reaction of the solubility rate suppressed layer is studied, using Differential Scanning Chromatography (DSC), Thermogravimetric analysis (TGA), Gel Permeation Chromatography (GPC), and Fourier Transform Infrared Spectroscopy (FT-IR). From the results of these analyses, it is concluded that the formation of the solubility rate suppressed layer is caused by the esterification reaction under the deep UV flood exposure between novolak resin and unphotoreacted PAC(Photo Active Conpound). Furthermore the influence of the flood exposure ligth wavelength to the pattern profile is studied. The best wavelength must be chosen for the used resist thickness to form a good pattern profile.