2011
DOI: 10.1109/jsen.2011.2155644
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A CMOS-Based ISFET Chemical Imager With Auto-Calibration Capability

Abstract: Abstract-This paper presents a novel auto-calibration technique for eliminating sensor mismatch in CMOS-based chemical imagers. Designed using an 8×8 array comprising of pH sensitive Ion Sensitive Field Effect Transistors (ISFETs), the chemical imager is capable of implementing a gradient based calibration algorithm by biasing programmable-gate (PG) ISFETs at a common operating point when exposed to a solution of homogenous pH. The system was fabricated in a typical 0.35µm CMOS technology and demonstrated a fa… Show more

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Cited by 47 publications
(16 citation statements)
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“…The target system is a two tier system consisting of a processing tier and a sensing tier implemented, respectively, in a 65 nm [17] and a 0.35 µm technology [18]. The choice of the 0.35 µm technology is due to the typical use of this technology for sensing circuits [18,19]. Older and therefore lower cost technologies are preferred for sensing applications since speed is not a critical requirement.…”
Section: Introductionmentioning
confidence: 99%
“…The target system is a two tier system consisting of a processing tier and a sensing tier implemented, respectively, in a 65 nm [17] and a 0.35 µm technology [18]. The choice of the 0.35 µm technology is due to the typical use of this technology for sensing circuits [18,19]. Older and therefore lower cost technologies are preferred for sensing applications since speed is not a critical requirement.…”
Section: Introductionmentioning
confidence: 99%
“…and i α and β are the scaling factors. Substituting Equation 7into Equation (19) and then into Equation (18) results in:…”
Section: Differential Sensingmentioning
confidence: 99%
“…In the aforementioned literature, either the single-point or the two-point calibration method is used to adjust the attribute of the temperature sensor. In addition to these conventional calibration approaches, researchers have also proposed methods such as self-calibration [15,16] and/or auto-calibration [17][18][19], to further reduce the complexity of the post fabrication calibration process.…”
Section: Introductionmentioning
confidence: 99%
“…Homogeneous inductive links have been demonstrated in both of these technologies, where the most advanced manufacturing process for a prototype inductive link is a 65 nm technology [18]. The choice of the 0.35 µm technology is due to the typical use of this technology for sensing circuits [19], [20]. In addition, these homogeneous links serve as a baseline for comparison.…”
Section: Introductionmentioning
confidence: 99%