2014
DOI: 10.1039/c4cp01651c
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A combined crossed molecular beams and ab initio investigation on the formation of vinylsulfidoboron (C2H311B32S)

Abstract: We exploited crossed molecular beams techniques and electronic structure calculations to provide compelling evidence that the vinylsulfidoboron molecule (C2H3(11)B(32)S) - the simplest member of hitherto elusive olefinic organo-sulfidoboron molecules (RBS) - can be formed via the gas phase reaction of boron monosulfide ((11)B(32)S) with ethylene (C2H4) under single collision conditions. The reaction mechanism follows indirect scattering dynamics via a barrierless addition of the boron monosulfide radical to th… Show more

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Cited by 6 publications
(7 citation statements)
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“…This holds in particular for bimolecular reactions between diatomic radicals and small hydrocarbons. Bimolecular reactions involving diatomic radicals such as boron monoxide (BO), [28][29][30][31][32][33][34][35] boron monosulfide (BS), [36][37] methylidyne (CH/CD), [38][39][40][41][42][43][44][45] cyano (CN), 32,[46][47][48][49][50][51][52][53][54][55][56][57][58][59][60] dicarbon (C 2 ), 57,[61][62][63][64][65][66][67][68][69][70][71][72][73][74] hydroxyl (OH), [75]…”
Section: Introductionmentioning
confidence: 99%
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“…This holds in particular for bimolecular reactions between diatomic radicals and small hydrocarbons. Bimolecular reactions involving diatomic radicals such as boron monoxide (BO), [28][29][30][31][32][33][34][35] boron monosulfide (BS), [36][37] methylidyne (CH/CD), [38][39][40][41][42][43][44][45] cyano (CN), 32,[46][47][48][49][50][51][52][53][54][55][56][57][58][59][60] dicarbon (C 2 ), 57,[61][62][63][64][65][66][67][68][69][70][71][72][73][74] hydroxyl (OH), [75]…”
Section: Introductionmentioning
confidence: 99%
“…This holds in particular for bimolecular reactions between diatomic radicals and small hydrocarbons. Bimolecular reactions involving diatomic radicals such as boron monoxide (BO), 28−35 boron monosulfide (BS), 36,37 methylidyne (CH/CD), 38−45 cyano (CN), 32,46−60 dicarbon (C 2 ), 57,61−74 hydroxyl (OH), 75−86 silicon nitride (SiN) 32 and silylidyne (SiH/SiD), 87 synthesized important transient species in extreme environments ranging from low temperature molecular clouds to high temperature combustion settings, interstellar, and chemical vapor deposition environments (Table 1). Among these diatomic radicals, reactions of the silylidyne radical (SiH; X 2 Π) with hydrocarbons have received particular attention as these bimolecular reactions are expected to result in the formation of small organosilicon molecules (SiC x H y , x ≤ 6, y ≤ 6).…”
Section: Introductionmentioning
confidence: 99%
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“…Based on a recommendation by Pyykko on the nature of multiple bonds, the boron–oxygen bonds of all boronyls illustrated here should be considered as triple bond, as they are shorter than 135 pm, a distance identified as representative of a boron–oxygen double bond. The extracted generalized concepts of a barrierless addition–hydrogen/methyl elimination and overall exoergic reaction are now being applied to elucidate the reaction dynamics of hitherto even more exotic systems: the formation of organic boronyl sulfides (RBS). , The reactions of the isovalent boronyl sulfide radical (BS) are conducted with unsaturated hydrocarbons such as acetylene and ethylene under single collision conditions accessing the previously elusive class of boronyl sulfides under collisionless conditions thus exploring the class of strange, new boronyl sulfides.…”
Section: Discussionmentioning
confidence: 99%
“…For heavier chalcogens, the thioxoborane and selenoxborane with boron–sulfur and −selenium double bonds have been isolated by bulky ligands . In addition, higher bond order forms with BS entity in thioborine (HBS), halogenated sulfidoboron (XBS), and organo sulfidoboron (RBS) molecules as short-lived products of the high temperature gas-phase reactions. However, there are barely examples reported for complexes containing aluminum or gallium with sulfur in multiple bonding characters.…”
Section: Introductionmentioning
confidence: 99%