2023 IEEE 73rd Electronic Components and Technology Conference (ECTC) 2023
DOI: 10.1109/ectc51909.2023.00351
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A combined simulation and experimental study on cracking and delamination behavior at the Cu/Polyimide interface of RDLs in chiplet package subjected to thermo-mechanical loads

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Cited by 3 publications
(1 citation statement)
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“…The RDL is generally composed of polyimide PI, a diffusion-resistant Ti layer, and Cu wiring. Due to the CTE mismatch between PI/Cu and the non-gas-tightness of PI, which can allow H 2 O and O 2 to pass through, the final delamination of the RDL is caused under dynamic service environments [79,80].…”
Section: Addition Of Barrier Layer On Top Of Rdl Stacksmentioning
confidence: 99%
“…The RDL is generally composed of polyimide PI, a diffusion-resistant Ti layer, and Cu wiring. Due to the CTE mismatch between PI/Cu and the non-gas-tightness of PI, which can allow H 2 O and O 2 to pass through, the final delamination of the RDL is caused under dynamic service environments [79,80].…”
Section: Addition Of Barrier Layer On Top Of Rdl Stacksmentioning
confidence: 99%