MHS'96 Proceedings of the Seventh International Symposium on Micro Machine and Human Science
DOI: 10.1109/mhs.1996.563405
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A compact SR beamline for fabrication of high aspect ratio MEMS microparts

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Cited by 17 publications
(7 citation statements)
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“…In our experiments, deep X-ray lithography is carried out using the beamline for the LIGA process of the synchrotron radiation (SR) light source, "AURORA", at Ritsumeikan University [8]. The beamline, which is com-…”
Section: Designmentioning
confidence: 99%
“…In our experiments, deep X-ray lithography is carried out using the beamline for the LIGA process of the synchrotron radiation (SR) light source, "AURORA", at Ritsumeikan University [8]. The beamline, which is com-…”
Section: Designmentioning
confidence: 99%
“…To manufacture high aspect ratio MEMS with high performance [5,6], we wanted to achieve the maximum lithography depth.…”
Section: Contrastmentioning
confidence: 99%
“…Pmin and PTh were obtained by the following proce dure, appropriate for the wavelength range for Xray lithography in the LIGA process using AURORA, which is mainly less than 7.3 A [5]. The beam spectrum of AURORA is converted into the exposure energy spectrum per unit time E_?…”
Section: Contrastmentioning
confidence: 99%
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“…3 shows 50 mm-high microgears obtained using a tungsten absorber with a silicon nitride membrane. Details are given by Sugiyama et al (1996). Photoelectron spectroscopy provides information on the electronic structure of materials and is indispensable in the development of semiconductor technology.…”
Section: Figurementioning
confidence: 99%