2013
DOI: 10.1109/ted.2013.2238237
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A Comparative Study of Different Physics-Based NBTI Models

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Cited by 280 publications
(166 citation statements)
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“…< 3 nm) used in current industry, however, hole injection and subsequent trapping is significant and the H/H2 RD model has been revised [10,11]. In the "RD based framework" [10,11], RD process covers only the generation of interface states (ΔVIT). Two other components have been added: i) As-grown hole traps (ΔVHT), and ii) Generation of bulk traps (ΔVOT).…”
Section: Failure Of the Rd Modelsmentioning
confidence: 99%
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“…< 3 nm) used in current industry, however, hole injection and subsequent trapping is significant and the H/H2 RD model has been revised [10,11]. In the "RD based framework" [10,11], RD process covers only the generation of interface states (ΔVIT). Two other components have been added: i) As-grown hole traps (ΔVHT), and ii) Generation of bulk traps (ΔVOT).…”
Section: Failure Of the Rd Modelsmentioning
confidence: 99%
“…Several NBTI models have been proposed, such as the two-stage model [9], reaction-diffusion (RD) based framework [10,11], the composite model [12], and the as-grown-generation (AG) model [13][14][15][16][17]. In order to verify their correctness, a common practice is to demonstrate that they can fit the test data well.…”
Section: Introductionmentioning
confidence: 99%
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“…Different models can explain the NBTI effect and match the experimental data under different measurement conditions. For example, the R-D model has been verified to be effective for a moderate to very long stress time [24]. In contrast, the T-D model is capable of predicting ultrafast measurement data more precisely; moreover, the T-D model can also capture the aging variability of the NBTI effect [21,25,26].…”
Section: Nbti-induced Transistor Agingmentioning
confidence: 99%
“…For example, NBTI increases with an increase in negative stress gate bias; therefore, the NBTI-induced ∆V th is dependent on the actual workload of the circuit. In addition, NBTI increases at an elevated temperature and shows Arrhenius T activation; NBTI recovers quickly after the stress is removed, and measured ∆V th and related parameters are sensitive to measurement delay [24]. In this paper, we will not cast our focus on NBTI's physical model but on a method to alleviate NBTI-induced performance degradation while reducing power dissipation to the greatest extent.…”
Section: Nbti-induced Transistor Agingmentioning
confidence: 99%