2017
DOI: 10.1016/j.ceramint.2017.05.094
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A comparative study of structural, optical and electrical properties of ZnS thin films obtained by thermal evaporation and SILAR techniques

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Cited by 32 publications
(12 citation statements)
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“…There are many deposition methods of ZnS thin films such as thermal evaporation method [6], ion assisted thermal evaporation [7], RF sputtering [8], spray pyrolysis [9], atomic layer deposition [10], electrochemical deposition [11], electron beam evaporation [12], SILAR [13], sol-gel [14], chemical bath deposition [15]. In this study, chemical bath deposition technique which is simple, safe and economic technique to deposit thin films has been used.…”
Section: Introductionmentioning
confidence: 99%
“…There are many deposition methods of ZnS thin films such as thermal evaporation method [6], ion assisted thermal evaporation [7], RF sputtering [8], spray pyrolysis [9], atomic layer deposition [10], electrochemical deposition [11], electron beam evaporation [12], SILAR [13], sol-gel [14], chemical bath deposition [15]. In this study, chemical bath deposition technique which is simple, safe and economic technique to deposit thin films has been used.…”
Section: Introductionmentioning
confidence: 99%
“…Where (h, k, l) are the Miller indices, d is the interplanar spacing which is determined by Bragg ' s equation [12]:…”
Section: Resultsmentioning
confidence: 99%
“…It is also clear that the increase in the intensity of the peaks is due to the increase of CuS ratio, where the CuS phase becomes dominant resulting to the formation of larger crystals and reduction of crystalline defects and orientation to the preferred orientation of the CuS compound 17 . The interplanar spacing (d) was calculated using Bragg's equation 9 :…”
Section: Resultsmentioning
confidence: 99%
“…It also has several other potential applications such as electroluminescence devices and buffer layer for solar cells 9 , etc. ZnS has been deposited by various techniques such as molecular beam epitaxy 10 , MOCVD 11 , chemical bath deposition 12 , and pulsed electrodeposition 13 etc.…”
Section: Introductionmentioning
confidence: 99%