A comparative study on the performance of a xenon capillary<i>Z</i>-pinch EUV lithography light source using a pinhole camera

Song, Inho; Iwata, Kazuhiro; Homma, Y.; Mohanty, S. R.; Watanabe, M.; Kawamura, T.; Okino, Akitoshi; Yasuda, Kôichi; Horioka, Kazuhiko; Hotta, Eiki

doi:10.1088/0963-0252/15/3/004

Cited by 11 publications

(3 citation statements)

References 15 publications

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“…Capillary discharge is known for its capability to produce moderately hot ionised plasma which emits in the EUV range of wavelength [1][2][3][4][5][6][7][8][9][10][11].For this reason, capillary discharge operated at different modes has been investigated as light sources. The modes of operation which have been investigated include the ablative and gasfilled modes as soft X-ray and EUV sources.…”

Section: Introductionmentioning

confidence: 99%

Enhancement of the EUV emission of a metallic capillary discharge operated with argon ambient gas

Chan¹,

Tan²,

Saboohi³

et al. 2014

AIP Conference Proceedings

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In this work, the metallic capillary discharge is operated with two different ambients: air and argon. In the experiments reported here, the chamber is first evacuated to 10 -5 mbar. The discharge is initiated by the transient hollow cathode effect generated electron beam, with either air ambient or argon ambient at 10 -4 mbar. The bombardment of electron beam at the tip of the stainless steel anode gives rise to a metallic vapor, which is injected into the capillary and initiates the main discharge through the capillary. The EUV emission is measured for different discharge voltages for both conditions and compared. It is found that the metallic capillary discharge with argon ambientis able to produce higher EUV energy compared to that with air ambient.

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Section: Introductionmentioning

confidence: 99%

Enhancement of the EUV emission of a metallic capillary discharge operated with argon ambient gas

Chan¹,

Tan²,

Saboohi³

et al. 2014

AIP Conference Proceedings

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“…Because of the complex nature and extreme conditions produced in the EUV plasma sources, several plasma diagnostics are needed to fully characterize these extreme ultraviolet lithography (EUVL) sources. This paper describes the development and employment of some EUV diagnostics at Tokyo Institute of Technology for characterizing the EUV emission from the pulsed plasma systems namely, capillary [12,13] and gas jet Z-pinch [14,15]. The performance of these EUV emitting sources have been investigated in terms of various technological aspects of EUV lithography.…”

Section: Introductionmentioning

confidence: 99%

EUV diagnostics of pulsed plasma systems

Mohanty

Hotta

2010

J. Phys.: Conf. Ser.

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Extreme ultraviolet (EUV) diagnostics have been a subject of continuing interest for last several decades in the field of space and plasma sciences. In recent days, EUV diagnostics are being widely employed in the laboratories and industries to characterize EUV emission from the EM radiation sources that have strong impacts on future technology. This paper gives description of some of the important EUV diagnostics such as EUV photon detector, EUV energy measurement system, EUV pinhole camera, grazing incidence spectrograph and transmission grating spectrograph employed at Tokyo Institute of Technology to characterize EUV emission from the low current (<15 kA) and low energy (~ ten of Joule) pulsed plasma systems and some typical results.

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“…Pulsed capillary discharges (PCDs) are versatile transient plasma devices which are currently being used in different applications, where a high aspect ratio, dense transient plasma is required. These applications include lasing in the extreme ultraviolet (EUV) [1][2][3], waveguiding for high power laser pulses [4,5], high harmonic generation [6], EUV sources for lithography [7][8][9][10][11][12] and plasma jets production [13][14][15][16]. Different initiation mechanisms are used in PCD, depending on the particular application.…”

Section: Introductionmentioning

confidence: 99%

Hollow cathode effects in the pre-breakdown phase of a pulsed capillary discharge

Avaria¹,

Guzmán

Ruiz

et al. 2009

Plasma Sources Sci. Technol.

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Experimental observations of the hollow cathode effect (HCE) in an open end pulsed capillary discharge (PCD) are presented. In the HCE axial electron beams emitted from a pre-breakdown plasma produced spontaneously in the hollow cathode region (HCR) assist ionization growth in the interelectrode volume. The PCD operates in argon at 0.6-1.4 Torr, ∼10 kV applied voltage. Time resolved spectroscopic measurements, with 15 ns time resolution, are used in conjunction with photomultiplier observations of light emission from the capillary ends, and Faraday cup measurements of axial electron beams, to characterize the pre-and post-breakdown processes in the HCR of the discharge. The HCR emission is found to be dominated by Ar II lines. Comparison between measured and synthetic spectra indicates that the pre-breakdown HCR plasma is characteristic of a collisional low pressure, low density plasma, whereas the post-breakdown HCR plasma, tens of nanoseconds after breakdown, is due to plasma ejection from the capillary volume. Experimental evidence of a zippering effect in post-breakdown capillary plasma heating, due to an initial axial pressure gradient, as predicted by computer simulations, has been found.

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A comparative study on the performance of a xenon capillaryZ-pinch EUV lithography light source using a pinhole camera

Cited by 11 publications

References 15 publications

Enhancement of the EUV emission of a metallic capillary discharge operated with argon ambient gas

Enhancement of the EUV emission of a metallic capillary discharge operated with argon ambient gas

EUV diagnostics of pulsed plasma systems

Hollow cathode effects in the pre-breakdown phase of a pulsed capillary discharge

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