A comparison of ion and fast atom beam reduction in TiO2

Saied, S.O.; Sullivan, J.L.; Choudhury, T; Pearce, CG

doi:10.1016/0042-207x(88)90492-7

Cited by 99 publications

(43 citation statements)

References 24 publications

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“…The binding energies determined for these levels were very close to those reported in literature for titanium dioxide [19,20]. A different picture is shown by both Ta-16 and Ta-4-16, and Ta-MCM catalysts, in which the higher values may account for a better incorporation of titanium in the solid network [21].…”

Section: Resultssupporting

confidence: 78%

Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol–gel and grafting in acetone degradation

et al. 2006

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Section: Resultssupporting

confidence: 78%

Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol–gel and grafting in acetone degradation

et al. 2006

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“…The oxidized surface layer is confirmed to be TiO 2 with the expected peaks for Ti 4+ (Ti2p 1/2 at 458.5 eV and Ti2p 3/2 at 464.2 eV) and O 2-(529.7 eV -The peak at 531.3 eV is due to surface hydroxyl groups) exhibited in the spectra [12][13][14][15]. Similar peaks were observed for all oxidized titanium surfaces.…”

Section: 1supporting

confidence: 61%

Evaluation of microwave plasma oxidation treatments for the fabrication of photoactive un-doped and carbon-doped TiO2 coatings

Dang

Rahman

MacElroy

et al. 2012

Surface and Coatings Technology

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The photoactivity of both un-doped and carbon-doped titanium dioxide (TiO 2 ) coatings has been widely reported. In this paper, the use of a microwave plasma as a novel oxidation treatment for the fabrication of these coatings is evaluated. The photoactivity performance of the microwave plasma-formed coatings is benchmarked against those fabricated through air furnace oxidation as well as those deposited using reactive magnetron sputtering. The un-doped and carbon-doped TiO 2 coatings were prepared respectively by microwave plasma-oxidizing titanium metal sheets and sputter deposited titanium carbide thin films. The resulting oxides were characterized using XPS, XRD, FEG-SEM, and optical profilometry. The oxide layer thicknesses achieved over the 15 to 45 minute oxidation times were in the range of 0.15 to 3.44 µm. These coatings were considerably thicker than those obtained by air furnace oxidation. The microwave plasma-formed oxides also exhibited significantly higher surface roughness values compared with the magnetron-sputtered coatings. The photoactivity performance of both un-doped and carbon-doped coatings was assessed using photocurrent density measurements. Comparing the un-doped TiO 2 coatings, it was observed that those obtained using the microwave plasma oxidation route yielded photocurrent density measurements that were 4.3 times higher than the TiO 2 coatings of the same thickness that were deposited by sputtering. The microwave plasmaoxidized titanium carbide coatings did not perform as well as the un-doped TiO 2 probably due to the presence of un-oxidized carbide in the coatings, which reduced their photoactivity.

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“…All the photoanode films show two binding energy peaks at 458.770.1 and 464.570.05 eV, corresponding to the Ti 2p 3/2 and Ti 2p 1/2 transitions, respectively. The intensity of peaks increase gradually with passing of treating time, revealing that the amount of deposited TiO 2 also increase accordingly [25]. Figure. 2b shows the O 1s spectra of samples, while the insets show spectrums of the reference (the blank sample) and ZnO film with 20 min surface modification.…”

Section: Surface Modification and Interface Properties Variationmentioning

confidence: 87%

Improved charge generation and collection in dye-sensitized solar cells with modified photoanode surface

et al. 2014

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A comparison of ion and fast atom beam reduction in TiO2

Cited by 99 publications

References 24 publications

Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol–gel and grafting in acetone degradation

Comparative photocatalytic behavior of Ta catalysts prepared by d.c.-sputtering, sol–gel and grafting in acetone degradation

Evaluation of microwave plasma oxidation treatments for the fabrication of photoactive un-doped and carbon-doped TiO2 coatings

Improved charge generation and collection in dye-sensitized solar cells with modified photoanode surface

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