A comprehensive review on the preparation and applications of delafossite CuAlO2 optoelectronic functional materials

Zhang, Jia-Xin; Zhao, Zong-Yan

doi:10.1016/j.mssp.2023.107819

Cited by 7 publications

(1 citation statement)

References 137 publications

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“…In each case, doped "boundary" layers can find applications. In case the exact formation of CuAlO 2 , AgAlO 2 and ZnAl 2 O 4 compounds is proved, the electrochemical synthesis of their thin layers for other promising applications actively under consideration, such as transparent conductive films [115][116][117][118][119][120][121][122][123], may be of interest for photoelectronic [124] and mechanical applications [125], optoelectronics [125], photo-thermoelectric and thermoelectric applications [126,127], fluorescence materials [128], sensors [125,[129][130][131], and electro-and photocatalysts [132][133][134][135][136].…”

Section: Possible Future Research and Applicationsmentioning

confidence: 99%

Porous and Ag-, Cu-, Zn-Doped Al2O3 Fabricated via Barrier Anodizing of Pure Al and Alloys

Poznyak,

Knörnschild,

Hoha

et al. 2024

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The paper breaks the general concepts and shows that pore formation is possible in anodic aluminum barrier oxide by anodizing of pure Al, and also presents the results of electrochemical anodizing in boric acid and citrate buffer aqueous solutions of homogeneous binary alloys AlCu (4 wt.%), AlZn (3 wt.%) and AlAg (5.2 wt.% and 16.2 wt.%). Barrier anodizing allowed obtaining Al2O3 thin films doped with copper, zinc and silver. The anodizing behavior and the effect of anodic current density on the charge were studied, and scanning electron microscopy, X-ray photoelectron spectroscopy and Auger electron spectroscopy analyses were performed. The doped alumina thin films, which are a mixture of Al2O3, Cu2O, ZnO, Ag2O, AgO and promising double metal oxides CuAlO2, AgAlO2 and ZnAl2O4, are promising for use as resistive switching, photoelectron, mechanical, photo-thermoelectric and fluorescence materials; sensors; and transparent conductive and photocatalyst films.

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Section: Possible Future Research and Applicationsmentioning

confidence: 99%

Porous and Ag-, Cu-, Zn-Doped Al2O3 Fabricated via Barrier Anodizing of Pure Al and Alloys

Poznyak,

Knörnschild,

Hoha

et al. 2024

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Copper tantalum nitride (CuTaN2) thin films prepared by reactive radio-frequency magnetron sputtering

Islam,

Ranga,

Borra

et al. 2024

Appl. Phys. A

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RF reactive sputtering was used to deposit copper tantalum nitride (CuTaN2) films from a Cu/Ta target in an environment containing a mixture of argon and nitrogen at two different substrate temperatures: room temperature and 200 °C. The films were studied by SEM, EDS, XRD, Raman spectroscopy, spectrophotometry, and resistivity measurements. The deposition conditions significantly impacted the morphology of the films, which varied from smooth, void-free films at high nitrogen concentrations and at room temperature substrates to cauliflower-like grains with voids at low nitrogen contents and elevated substrate temperatures. Despite the target’s 1:1 Cu: Ta ratio, the stoichiometric analysis showed a lower Ta content in the deposited film. The films produced on silicon substrates were polycrystalline, whereas those deposited on glass substrates were amorphous. The band gap (0.9 eV to 1.55 eV) and film resistivity (20 kΩ-cm to 76 kΩ-cm) are strongly affected by the nitrogen fraction in the sputtering gas. Increasing the nitrogen percentage in semiconductor films results in smoother films with larger bandgaps (approximately 1.5 eV), higher resistivity, and compositions closest to those of stoichiometric CuTaN2.

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Enhancing the performance of pyridyl carboxamide-N,N-dimethyl amino chalcone (PCC) as a dye sensitizer for dye-sensitized solar cells (DSSCs) through the incorporation of electron donor moieties

Nassar,

Abdulmalek,

Ismail

et al. 2024

International Journal of Electrochemical Science

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A comprehensive review on the preparation and applications of delafossite CuAlO2 optoelectronic functional materials

Cited by 7 publications

References 137 publications

Porous and Ag-, Cu-, Zn-Doped Al2O3 Fabricated via Barrier Anodizing of Pure Al and Alloys

Porous and Ag-, Cu-, Zn-Doped Al2O3 Fabricated via Barrier Anodizing of Pure Al and Alloys

Copper tantalum nitride (CuTaN2) thin films prepared by reactive radio-frequency magnetron sputtering

Enhancing the performance of pyridyl carboxamide-N,N-dimethyl amino chalcone (PCC) as a dye sensitizer for dye-sensitized solar cells (DSSCs) through the incorporation of electron donor moieties

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