Abstract:Ion implantation is a critical technology in semiconductor Ultra Large Scale Integration (ULSI). Binary collision approximation (BCA)-based Monte Carlo (MC) ion implantation simulators are commonly used to predict the impurity and damage profiles. A deterministic propagator is needed in these simulators to simulate the propagation of ions in crystalline materials. A search-for-target algorithm is frequently called to determine the collision partners and collision parameters in a deterministic propagator, and t… Show more
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