A concept of fully integrated MEMS-type electron microscope

Krysztof, M.; Górecka-Drzazga, Anna; Dziuban, Jan

doi:10.1109/ivnc.2014.6894767

Cited by 14 publications

(4 citation statements)

References 6 publications

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“…At this stage of research, the individual silicon electrodes of the MEMS microscope were close to each other, but they were not tightly connected (using a vacuum anodic bonding process, as was seen in figure 1(b)). A planar, field-emission silicon cathode (12 × 16 mm 2 ) with electrophoretically deposited CNT layer (1 × 1 mm 2 ) was used as the source of the electron beam [11]. An extraction electrode (gate), a silicon electrode with a central 1 × 1 mm 2 square hole, was used to lower the threshold voltage of electron emission and reduce the electron beam spot.…”

Section: Measurements Of the Test Structure Of The Mems Microscopementioning

confidence: 99%

“…Our concept assumes the fabrication of a TEM microscope [11] in the form of a silicon-glass, sandwich-like structure (figure 1) containing an electron gun (1), an electron optics column with Einzel lens (2), and an anode equipped with a very thin membrane (3) which allows the electron beam to penetrate the specimen placed on the membrane. All these parts are vacuum-sealed and integrated with a miniature highvacuum micropump (4) [12].…”

Section: Introductionmentioning

confidence: 99%

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Preliminary research on imaging in MEMS electron microscope

Krysztof

Górecka-Drzazga

2019

Meas. Sci. Technol.

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The purpose of this article is to present preliminary results of research on imaging in a newly designed and micro-electro-mechanical system (MEMS) transmission electron microscope being developed. The main element of the MEMS microscope is an electron gun with an anode, which contains a very thin silicon nitride membrane; it separates the high-vacuum chamber of the microdevice from a sample that is located outside an electron optics column, on the anode in the air. The parallel electron beam that passes the membrane illuminates the studied sample. Thus, a new detection system, located outside the MEMS electron microscope structure, has to be developed. In this paper, the results of the computer simulations and the measurements of transmissivity and a scattering angle of the electron beam passing through a very thin silicon nitride membrane are presented. The influence of these parameters on the image generated on the scintillator crystal screen, placed above the anode with a sample, is considered. We also present an image of a copper wire placed over the thin silicon nitride membrane that was produced using the designed detection system.

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Section: Measurements Of the Test Structure Of The Mems Microscopementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Preliminary research on imaging in MEMS electron microscope

Krysztof

Górecka-Drzazga

2019

Meas. Sci. Technol.

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“…Miniature electronic devices and instruments based on free electron beam, especially those scaled down on a chip by microfabrication technologies, are attracting more and more research interest, as they show the advantages of smaller footprint and cheaper batch fabrication when compared with their traditional counterparts. To date, many such compact devices and instruments have been reported, including X-ray sources, [1][2][3][4] electron microscopes, [5,6] mass spectrometers, [7][8][9] microwave amplifiers, [10,11] field emission displays, [12][13][14][15] sensors, [16,17] etc. An electron source for generating free electron beam is required for all those miniature vacuum electronic devices and instruments.…”

Section: Introductionmentioning

confidence: 99%

Pressure Sensitivity of Electron Emission from SiO_x Tunneling Diodes and their Outstanding Emission Performance under Rough Vacuum

Zhan

Yang

et al. 2022

Adv Elect Materials

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On‐chip electron sources with low pressure‐sensitivity and outstanding emission performances under rough vacuum are highly desired for developing miniature fully encapsulated vacuum electronic devices. Here, the sensitivity of electron emission from SiOx tunneling diodes formed in electroformed SiOx to the variation of ambient vacuum pressure from ≈10−4 to ≈102 Pa is explored. Electron emission from SiOx tunneling diodes is found to be insensitive to pressure variation when the pressure is lower than ≈10−1 Pa and exhibits fast degradation above the pressure, showing much lower pressure sensitivity than field emission sources. Despite emission current degradation above ≈10−1 Pa, SiOx tunneling diodes exhibit stable and reproducible electron emission under fixed rough vacuum up to 8 Pa, and good restorability after being repeatedly exposed to air pressure. By analyzing transport current of SiOx tunneling diodes under varying ambient vacuum pressure, the degradation of emission current above ≈10−1 Pa is attributed to the widening of insulating SiOx channel in the diode due to the transformation of Si conducting filament to SiOx with increasing oxygen partial pressure.

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“…In 2014 [10,11], a new microcolumn solution was proposed that consists of all the parts needed to fabricate a miniature scanning electron microscope (Figure 1). The most important innovation of this instrument is that it is equipped with a miniature MEMS high vacuum micropump, which ensures a high vacuum (up to 10 −7 mbar) within the microdevice [12].…”

Section: Introductionmentioning

confidence: 99%

Design of an Einzel Lens with Square Cross-Section

Krysztof

2021

Electronics

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In this paper, the results of modeling and simulation of a microcolumn are presented. The microcolumn is part of a developed miniature MEMS electron microscope equipped with a miniature MEMS high-vacuum micropump. Such an arrangement makes this device the first stand-alone miniature electron-optical device to operate without an external high-vacuum chamber. Before such a device can be fabricated, research on particular elements must be carried out to determine the working principles of the device. The results of the calculations described in this article help us to understand the work of a microcolumn with square holes in the electrodes. The formation of an electron beam spot at the anode is discussed. Further calculations and results show the dependence of the Einzel lens size on the electron beam spot diameter, electron beam current, and microcolumn focusing voltage. The results are used to define the optimal design of the developed MEMS electron microscope.

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A concept of fully integrated MEMS-type electron microscope

Cited by 14 publications

References 6 publications

Preliminary research on imaging in MEMS electron microscope

Preliminary research on imaging in MEMS electron microscope

Pressure Sensitivity of Electron Emission from SiO_x Tunneling Diodes and their Outstanding Emission Performance under Rough Vacuum

Design of an Einzel Lens with Square Cross-Section

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A concept of fully integrated MEMS-type electron microscope

Cited by 14 publications

References 6 publications

Preliminary research on imaging in MEMS electron microscope

Preliminary research on imaging in MEMS electron microscope

Pressure Sensitivity of Electron Emission from SiOx Tunneling Diodes and their Outstanding Emission Performance under Rough Vacuum

Design of an Einzel Lens with Square Cross-Section

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Product

Resources

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Pressure Sensitivity of Electron Emission from SiO_x Tunneling Diodes and their Outstanding Emission Performance under Rough Vacuum