1999
DOI: 10.1557/jmr.1999.0306
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A critical examination of the fundamental relations used in the analysis of nanoindentation data

Abstract: Methods for analyzing nanoindentation load-displacement data to determine hardness and elastic modulus are based on analytical solutions for the indentation of an elastic half-space by rigid axisymmetric indenters. Careful examination of Sneddon's solution for indentation by a rigid cone reveals several largely ignored features that have important implications for nanoindentation property measurement. Finite element and analytical results are presented that show corrections to Sneddon's equations are needed if… Show more

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Cited by 400 publications
(222 citation statements)
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“…By means of a three-dimensional simulation of a sharp indentation, β takes the value of 1.05 which is almost independent on the material [36]. The second correction factor γ introduced by Hay et al [37] only depends on the Poisson's ratio as follows:…”
Section: Indentation On Massive Materialsmentioning
confidence: 99%
“…By means of a three-dimensional simulation of a sharp indentation, β takes the value of 1.05 which is almost independent on the material [36]. The second correction factor γ introduced by Hay et al [37] only depends on the Poisson's ratio as follows:…”
Section: Indentation On Massive Materialsmentioning
confidence: 99%
“…In the context of a perfect elastic contact Hay et al [5] show that the correction factor depends on the Poisson's ratio. Studies by Cheng and Cheng [6] and Dao et al [7], using dimensional analysis and finite element calculations in the case of elastic/plastic materials with work hardening, demonstrate also the existence of this correction factor, suggesting that it also depends on the elastoplastic properties of the material.…”
mentioning
confidence: 99%
“…As a result of nanoindentation experiments, load-displacement curves were obtained and two mechanical characteristics of substrate and investigated films -indentation hardness (HIT) and indentation modulus (EIT) -were calculated using Oliver & Pharr approximation method [5,6]. The results we receive are objectively limited by the load / penetration potential of the used indenter(maximum load=500mN).…”
Section: Fig1 Sem Micrograph Of Electrochemically Deposited Copper Fmentioning
confidence: 99%