A Critical Review of the Oxidation of Ti2AlC, Ti3AlC2and Cr2AlC in Air

Tallman, Darin J.; Anasori, Babak; Barsoum, Michel W.

doi:10.1080/21663831.2013.806364

Cited by 324 publications

(192 citation statements)

References 45 publications

Supporting

Mentioning

182

Contrasting

Unclassified

Order By: Relevance

“…This behavior has been widely studied in the literature and related to grain growth in the scale, with rate control by oxygen grain boundary diffusion. [24,25,17,23,27,28] Little differences are noted between Ti 2 AlC or Ti 3 AlC 2 substrates [17]. Static furnace oxidation in water vapor has not been shown to produce significant changes in the kinetic law or rate constants.…”

Section: Weight Change Behaviorsmentioning

confidence: 89%

“…Additionally, some MAX phases possess excellent oxidation resistance because of their Al 2 O 3 -forming ability. These would include Ti 3 AlC 2 , Ti 2 AlC, and Cr 2 AlC [17]. As candidates for various high temperature applications, it is reasonable to envision MAX phases in turbine environments for some novel uses, including bond coats for TBCs [18,19].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Environmental resistance of a Ti2AlC-type MAX phase in a high pressure burner rig

Smialek

2017

Journal of the European Ceramic Society

View full text Add to dashboard Cite

Section: Weight Change Behaviorsmentioning

confidence: 89%

Section: Introductionmentioning

confidence: 99%

Environmental resistance of a Ti2AlC-type MAX phase in a high pressure burner rig

Smialek

2017

Journal of the European Ceramic Society

View full text Add to dashboard Cite

“…1,3 Among the more than 70þ different MAX phases that have been synthesized to date, some Al-containing ones, notably Ti 2 AlC, have attracted the most attention due to their exceptional oxidation resistance. [7][8][9] Crack self-healing characteristics have also been reported during the oxidation of Ti 2 AlC and Ti 3 AlC 2 . [10][11][12] More recently, we showed that by selectively etching the Al from Al-containing MAX phases, it is possible to synthesize a new family of two-dimensional (2D) materials, which we labeled MXenes.…”

Section: Introductionmentioning

confidence: 91%

Experimental and theoretical characterization of ordered MAX phases Mo2TiAlC2 and Mo2Ti2AlC3

Anasori

Dahlqvist

Halim

et al. 2015

Journal of Applied Physics

Self Cite

262

180

View full text Add to dashboard Cite

Herein, we report on the phase stabilities and crystal structures of two newly discovered ordered, quaternary MAX phases-Mo 2 TiAlC 2 and Mo 2 Ti 2 AlC 3 -synthesized by mixing and heating different elemental powder mixtures of mMo:(3-m)Ti:1.1Al:2C with 1.5 m 2.2 and 2Mo: 2Ti:1.1Al:2.7C to 1600 C for 4 h under Ar flow. In general, for m ! 2 an ordered 312 phase, (Mo 2 Ti)AlC 2 , was the majority phase; for m < 2, an ordered 413 phase (Mo 2 Ti 2 )AlC 3 , was the major product. The actual chemistries determined from X-ray photoelectron spectroscopy (XPS) are Mo 2 TiAlC 1.7 and Mo 2 Ti 1.9 Al 0.9 C 2.5 , respectively. High resolution scanning transmission microscopy, XPS and Rietveld analysis of powder X-ray diffraction confirmed the general ordered stacking sequence to be Mo-Ti-Mo-Al-Mo-Ti-Mo for Mo 2 TiAlC 2 and Mo-Ti-Ti-Mo-Al-Mo-Ti-TiMo for Mo 2 Ti 2 AlC 3 , with the carbon atoms occupying the octahedral sites between the transition metal layers. Consistent with the experimental results, the theoretical calculations clearly show that M layer ordering is mostly driven by the high penalty paid in energy by having the Mo atoms surrounded by C in a face-centered configuration, i.e., in the center of the M nþ1 X n blocks. At 331 GPa and 367 GPa, respectively, the Young's moduli of the ordered Mo 2 TiAlC 2 and Mo 2 Ti 2 AlC 3 are predicted to be higher than those calculated for their ternary end members. Like most other MAX phases, because of the high density of states at the Fermi level, the resistivity measurement over 300 to 10 K for both phases showed metallic behavior. V C 2015 AIP Publishing LLC.

show abstract

“…Commonly, the A element is Al, as in Ti2AlC, Ti3AlC2 and Zr2Al3C4, causing improvement in high temperature oxidation resistance by the formation of a continuous and dense oxygen diffusion barrier of alumina on the surface [5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of Zr2Al3C4 thin films

Lai

Tucker

et al. 2015

Thin Solid Films

View full text Add to dashboard Cite

Zr2Al3C4 is an inherently nanolaminated carbide where layers of ZrC alternate with layers of Al3C2. Characterization of bulk samples has shown it has improved damage tolerance and oxidation resistance compared to its binary counterpart ZrC. Though a potential candidate for coatings applied for use in harsh environments, thin films of Zr2Al3C4 have not been reported. We have synthesized epitaxial Zr2Al3C4 thin films by pulsed cathodic arc deposition from three elemental cathodes, and have studied the effect of incident atomic flux ratio, deposition temperature, and choice of substrate on material quality. X-ray diffraction analysis showed that Zr2Al3C4 of the highest structural quality was obtained for growth on 4 H-SiC(001) substrate at 800 °C. Also, suppression of competing phases could be achieved on α-Al2O3(001) at elevated substrate temperatures. Very similar growth behavior to that of the well-known Mn+1AXn phasesAl supersaturation, binary carbide intergrowth and high sensitivity to choice of substrate -indicates a strong connection between the two families of materials, despite their differences in structure and in chemistry.

show abstract

A Critical Review of the Oxidation of Ti₂AlC, Ti₃AlC₂and Cr₂AlC in Air

Cited by 324 publications

References 45 publications

Environmental resistance of a Ti2AlC-type MAX phase in a high pressure burner rig

Environmental resistance of a Ti2AlC-type MAX phase in a high pressure burner rig

Experimental and theoretical characterization of ordered MAX phases Mo2TiAlC2 and Mo2Ti2AlC3

Synthesis and characterization of Zr2Al3C4 thin films

Contact Info

Product

Resources

About