A Detailed Description of the Chemistry of Thiol Supporting Plasma Polymer Films

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

Aparicio

Laha³

et al. 2014

Self Cite

In this work, the influence of the substrate temperature (Ts) on the chemical composition of propanethiol plasma polymers was investigated for a given set of plasma conditions. In a first study, a decrease in the atomic sulfur content (at. %S) with the deposition time (td) was observed. This behavior is explained by the heating of the growing film during deposition process, limiting the incorporation of stable sulfur-based molecules produced in the plasma. Experiments carried out by controlling the substrate temperature support this hypothesis. On the other hand, an empirical law relating the Ts and the at. %S was established. This allows for the formation of gradient layer presenting a heterogeneous chemical composition along the thickness, as determined by depth profile analysis combining X-ray photoelectron spectroscopy and C60 ion gun sputtering. The experimental data fit with the one predicted from our empiric description. The whole set of our results provide new insights in the relationship between the substrate temperature and the sulfur content in sulfur-based plasma polymers, essential for future developments.

Section: Introductionmentioning

confidence: 99%

Surface temperature: A key parameter to control the propanethiol plasma polymer chemistry

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

Aparicio

Laha³

et al. 2014

Self Cite

“…Then, the comparison between plasma and film chemistries enables to improve the mechanistic understanding of the plasma polymer formation. On this basis, mass spectrometry measurements, in situ FTIR spectroscopy, and in a lesser extent emission spectroscopy have been employed for identifying the species formed through dissociations/rearrangements reactions in the discharge. Although these studies allowed gaining thorough understanding regarding the evolution of the functionality of the coating with respect to the process parameters, some aspects remain unclear, especially concerning the surface reactions.…”

Section: Introductionmentioning

confidence: 99%

In situ IR Spectroscopy as a Tool to Better Understand the Growth Mechanisms of Plasma Polymers Thin Films

Ligot

Cormier

et al. 2015

Plasma Process. Polym.

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Aiming to get a better understanding of the growth mechanism during the plasma polymerization process of ethyl lactate, the surface reactivity of ester-bearing fragments has been determined by combining in situ FTIR spectroscopy and XPS measurements. While the plasma density of the reactive ester-bearing fragment decreases by one order of magnitude (from $2 Â 10 20 m À3 to $2 Â 10 19 m À3 ) as the power increases from 60 to 280 W, the ester group density in the plasma polymer films decreases from $1.5 Â 10 19 m À2 /m2 to $1.7 Â 10 18 m À2 . The associated incorporation efficiency of the reactive ester-bearings fragments in the films (s ester ) consequently increases from 2.6 Â 10 À6 to 1.3 Â 10 À4 when increasing the power. This behavior is attributed to higher activation the growing film surface.

“…To explain this behavior, let us first mention that the residence time of the particles in the chamber is much higher than the longest pulse period considered here (i.e., 18 ms for the residence time vs. 2.1 ms for the longest pulse period). Therefore, when increasing t off and hence the pulse period, the molecules are exposed to lower number of plasma “on” time ( t on ) during their residence in the reactor resulting in a less pronounced fragmentation …”

Section: Resultsmentioning

confidence: 99%

“…Today, despite the highly complex growth mechanism of plasma polymer film (PPF) including a multitude of gas phase and surface reactions, it is possible to finely control the chemistry of the PPF using suitable experimental conditions (i.e., low energetic conditions, use of pulsed mode, …) . On the other hand, tailoring the morphology of the PPF at the nanoscale is much more challenging.…”

Section: Introductionmentioning

confidence: 99%

Tailoring the chemistry and the nano-architecture of organic thin films using cold plasma processes

Chauvin

Mel

et al. 2017

Plasma Process Polym

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In this work, we report on the development of a novel approach based on three different plasma-based processes (i.e., plasma polymerization, magnetron sputtering, and plasma etching) to fabricate nanostructured polymer thin films. Our strategy involves at first the formation of nitrogen containing plasma polymer film subsequently covered by silver nanoparticles, serving as a hard etching mask, using magnetron sputtering. Then, the exposition of the material to a complex mixture of highly reactive radicals, ions, and photons results in the structuring at the nanoscale of the functionalized plasma polymer films. It has been demonstrated that the dimension, the shape (e.g,. nanodome, nano-cone, nano-valley, inter-connected porous network, . . .) and the chemical composition of the nanoobjects can be tailored by adjusting the plasma parameters in each step of our overall procedure.