A double hot cathode lateral extraction Penning ion source

Ma, M.; Stephens, K.G.; Sealy, B.J.; Mynard, J.E.

doi:10.1063/1.1142916

Cited by 3 publications

(3 citation statements)

References 2 publications

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“…2. Schematic diagram of the test bench for DUHOCAMIS: (1) Ion source magnet, (2-4) triode extraction system, (5) electrostatic deflector, (6) magnetic shield, (7) Faraday cup, (8) vacuum port, (9) analyzing magnet and (10) target chamber. Fig.…”

Section: Extraction System and Test Benchmentioning

confidence: 99%

“…A noticeable feature of this configuration is that the source could be changed operating mode between DHCD and PIG discharge mode easily, when the switch K is turned on the contact D (i.e., the potential of the sputter cathode is the same as the cathode) [8,9] or P (i.e., the potential of the sputter cathode is the same as the anode) [10,11], respectively.…”

Section: Experimental Setup 21 Ion Source Structurementioning

confidence: 99%

“…When switch K is connected to contact D (i.e. the potential of the sputter cathode is the same as the cathode), the source will operate in the DHCD mode [8,9] ; When switch K is connected to contact P (i.e. the potential of the sputter cathode is the same as the anode), the source will operate in the PIG discharge mode [10,11].…”

Section: Ion Source Structurementioning

confidence: 99%

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Discharge characteristics of the DUHOCAMIS with a high magnetic bottle-shaped field

Zhao

Guo

et al. 2014

Chinese Phys. C

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For the purpose to produce high intensity, multiply charged metal ion beams, the DUHOCAMIS (dual hollow cathode ion source for metal ions) was derived from the hot cathode Penning ion source combined with the hollow cathode sputtering experiments in 2007. It was interesting to investigate the behavior of this discharge geometry in a stronger magnetic bottle-shaped field. So a new test bench for DUHOCAMIS with a high magnetic bottle-shaped field up to 0.6 T has been set up at Peking University, on which have been made primary experiments in connection with discharge characteristics of the source. The experiments with magnetic fields from 0.13 T to 0.52 T have shown that the magnetic flux densities are very sensitive to the discharge behavior: discharge curves and ion spectra. It has been found that the slope of discharge curves in a very wide range can be controlled by changing the magnetic field as well as regulated by adjusting cathode heating power. On the other hand, by comparison of discharge curves between dual hollow cathode discharge (DHCD) mode and PIG discharge mode, it was found a much stronger magnetic effect occurred on DHCD mode. In this paper, the new test bench with ion source structure is described in detail; and main experimental results are presented and discussed, including the effects of cathode heating power and magnetic flux density on discharge characteristics, also the ion spectra. The effects of the magnetic field on the source operating are emphasized, and a unique behavior of the DUHOCAMIS operating in the high magnetic field is expected and discussed especially.

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Section: Extraction System and Test Benchmentioning

confidence: 99%

Section: Experimental Setup 21 Ion Source Structurementioning

confidence: 99%

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Discharge characteristics of the DUHOCAMIS with a high magnetic bottle-shaped field

Zhao

Guo

et al. 2014

Chinese Phys. C

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Numerical simulation study on discharge characteristics of the Dual hollow cathode plasma source using magnetic mirror field

Zhu,

Fu,

Cai

et al. 2024

Phys. Scr.

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A two-dimensional fluid model of a double hollow cathode discharge structure constrained by a magnetic mirror field is established. The discharge is ignited by a hot cathode arc, and the length of the discharge arc column fills the entire central region of the double hollow cathode structure under the action of the magnetic field, with the electrons self-sustainedly oscillating on the axis. The electron density within the hollow cathode tube does not increase all the time with the arc voltage, the enhancement of the wall ion current by the arc voltage is very obvious, and the hollow cathode discharge is a result of the mutual enhancement of the arc voltage and the hollow cathode voltage. Hollow cathode sputtering needs to reach a certain voltage threshold to ensure that the inner wall has sufficient ion energy and that there exists an optimal radius range to maintain the discharge chamber to achieve a high plasma density and to favor hollow cathode sputtering.

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