2020
DOI: 10.35848/1882-0786/ab84bd
|View full text |Cite
|
Sign up to set email alerts
|

A flexible self-calibration method for large-stroke motion stage by using the multi-region stitching strategy based on least square algorithm

Abstract: In this letter, a flexible self-calibration method for large-stroke motion stage (LSMS) was proposed, which adopted the multi-region stitching strategy based on least square algorithm. Through the segmentation of LSMS and the stitching correction of small regions, the compensation of positional accuracy of LSMS was carried out successfully, which breaks through the technical limitation that the current self-calibration method can only calibrate a limited area. This presented method can be expected to realize t… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2020
2020
2021
2021

Publication Types

Select...
2

Relationship

1
1

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 28 publications
0
1
0
Order By: Relevance
“…What's more, to obtain the best compensation optimization effect, self-calibration technology is introduced into the scanning lithography system to ensure the motion accuracy and stability of the system. According to the previous two-dimensional selfcalibration compensation study, 23,29,30) the positional accuracy of the lithographic motion stage can be effectively controlled within 150 nm. In the verification experiment, 2 μm linear grating patterns with horizontal direction and tilted direction were used for exposure, respectively.…”
mentioning
confidence: 99%
“…What's more, to obtain the best compensation optimization effect, self-calibration technology is introduced into the scanning lithography system to ensure the motion accuracy and stability of the system. According to the previous two-dimensional selfcalibration compensation study, 23,29,30) the positional accuracy of the lithographic motion stage can be effectively controlled within 150 nm. In the verification experiment, 2 μm linear grating patterns with horizontal direction and tilted direction were used for exposure, respectively.…”
mentioning
confidence: 99%