“…What's more, to obtain the best compensation optimization effect, self-calibration technology is introduced into the scanning lithography system to ensure the motion accuracy and stability of the system. According to the previous two-dimensional selfcalibration compensation study, 23,29,30) the positional accuracy of the lithographic motion stage can be effectively controlled within 150 nm. In the verification experiment, 2 μm linear grating patterns with horizontal direction and tilted direction were used for exposure, respectively.…”