A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Ng, Philip C. W.; Tsai, Kuen-Yu; Lee, Yen-Min; Pei, Ting-Han; Wang, Fu Min; Li, Jia-Han; Chen, Alek C.

doi:10.1117/12.837077

SPIE Proceedings

2009

DOI: 10.1117/12.837077

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A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Philip C. W. Ng

Kuen-Yu Tsai

Yen-Min Lee

et al.

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A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

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